CO2 Laser-induced fluorination of some carbon oxides and sulfides by sulfur hexafluoride

1982 ◽  
Vol 47 (3) ◽  
pp. 918-927 ◽  
Author(s):  
Josef Pola

The cw CO2 laser induced interactions between SF6 and carbon compounds as CO2, C3O2, CO, COS, and CS2 are reported and their mechanism is discussed. The results show SF6 activated by laser radiation to fluorinate carbon compounds of their fragments to yield COF2, SOF2, CF4 and C2F6. The laser-induced processes are shown to possess features different from those of the appropriate thermally induced reactions.

2017 ◽  
Vol 38 (4) ◽  
pp. 369-374 ◽  
Author(s):  
S. R. Allayarov ◽  
E. M. Tolstopyatov ◽  
D. A. Dixon ◽  
L. A. Kalinin ◽  
P. N. Grakovich ◽  
...  

1995 ◽  
Vol 78 (11) ◽  
pp. 6477-6480 ◽  
Author(s):  
C. Sammet ◽  
M. Völcker ◽  
W. Krieger ◽  
H. Walther

1968 ◽  
Vol 27 (8) ◽  
pp. 470-471 ◽  
Author(s):  
A.F. Gibson ◽  
T.P. Hughes ◽  
M.F. Kimmitt ◽  
R. Hallin

1979 ◽  
Vol 44 (7) ◽  
pp. 2092-2095 ◽  
Author(s):  
Josef Pola ◽  
Pavel Engst ◽  
Milan Horák

The CO2 cw laser induced interaction of sulfur hexafluoride with chlorine, silicon tetrachloride, trichlorosilane, and methyltrichlorosilane in a glass reaction vessel has been investigated. The reaction of SF6 with glass surface yielding silicon tetrafluoride and thionyl fluoride was observed. It is inhibited by the products and its rate increases with growing initial pressure (0.6-5.3 kPa) of SF6. Presumed vibrationally excited or dissociated SF6 undergoes the same reaction in the presence of chlorine and silicon tetrachloride, too. The reaction is suppressed by the addition of trichlorosilane and methyltrichlorosilane; in these cases SiF4, SiCl4 and HCl, or SiF4, SiCl4, HCl, acetylene and carbon disulfide are formed. The products indicate a non-sensitizing action of SF6 and a specific reaction channel for the formation of CS2 not attainable by pyrolysis.


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