To the theory of radiation chemistry. II. Calculation of relative radiation chemical yields of the phase radiolysis of methanol

1966 ◽  
Vol 31 (8) ◽  
pp. 3263-3279 ◽  
Author(s):  
Z. Prášil
Keyword(s):  
Radiation Chemistry ◽  
Radiation Chemical

Vapor phase radiation chemistry studied by electron spin resonance spectroscopy

1967 ◽  
Vol 45 (8) ◽  
pp. 779-783
Author(s):  
D. R. Smith ◽  
J. C. Tole
Keyword(s):  
Electron Spin Resonance ◽  
Electron Spin ◽  
Vapor Phase ◽  
Radiation Chemistry ◽  
Benzene Vapor ◽  
Resonance Spectroscopy ◽  
Radiation Chemical ◽  
Solid Deposit ◽  
Conventional Radiation ◽  
Spin Resonance

The techniques and some preliminary results of an indirect method of studying vapor phase radiolysis by electron spin resonance (e.s.r.) spectroscopy are reported. After traversing a beam of 40 keV Ar+ ions, a stream of vapor is condensed on a cold finger at 77 °K. Free radicals which are formed by ion bombardment in the vapor phase become trapped in the solid deposit and are detected by e.s.r. Various vapors such as cyclopentane, cyclohexane, benzene, and ethanol have been bombarded at room temperature. The results correlate with conventional radiation chemical data. For example, benzene forms [Formula: see text] (and probably [Formula: see text]) radicals. These may be the intermediates which lead to polymer formation when benzene vapor is irradiated. The potential value of the experiment to vapor phase radiation chemistry is discussed.

The Radiation Chemistry of Solutions of P4 in CCl3Br: the Formation of Diphosphines

1969 ◽  
Vol 24 (11) ◽  
pp. 1393-1397 ◽  
Author(s):  
P. L. Airey
Keyword(s):  
Ionizing Radiation ◽  
Radiation Chemistry ◽  
Red Phosphorus ◽  
Radiation Chemical

The diphosphines CCl3 (Br) P2 (Br) CCl3 and CCl3 (Br) P2Br2 are formed when solutions of P4 in CCl3Br are exposed to ionizing radiation or maintained at 100°C for an hour. The radiation chemical yields (G values) are respectively 230 and 170 at RT. No “red” phosphorus is formed. The diphosphines react with Br2 to form CCl3Br; with Cl2 to form CCl3Br, Br2 and PCl3; and with EtOH to form CCl3P (OEt) 2 and CCl3P (H) (O) (OEt).

Formation and Degradation of Halogenated Organic Acids. Radiation versus Photocatalytically Induced Processes

1998 ◽  
Vol 3 (1) ◽  
Author(s):  
Oksana Makogon ◽  
Roman Fliount ◽  
Klaus-Dieter Asmus
Keyword(s):  
Organic Acids ◽  
Aqueous Solutions ◽  
Radiation Chemistry ◽  
Peroxyl Radicals ◽  
Organic Substrates ◽  
Radiation Chemical ◽  
Complementary Methods ◽  
Degradation Processes ◽  
Dilute Aqueous Solutions ◽  
Tribromoacetic Acid

AbstractRadiation chemistry and photocatalysis are introduced as complementary methods for the study of the radical- and redox-induced degradation of organic substrates. Particular focus is devoted on the reductive and oxidative formation and destruction of halogenated organic acids, as intermediates in the degradation of halo- genated hydrocarbons, in dilute aqueous solutions. The specific aim of this comparative essay is to point out the fundamental similarities between a radiation chemical and photocatalytical approach but, at the same time, to demonstrate that and why significant differences may, nevertheless, be observed. The examples presented and discussed are concerned with (i) the oxidatively and reductively induced degradation of 1,1,1-trichloroethane to organic acids, (ii) corresponding experiments on the degradation of trifluoro-, trichloro- and tribromoacetic acid, (iii) peculiarities of the degradation processes in the absence of oxygen, and (iv) the importance of the cross­termination reaction between halogenated peroxyl radicals and superoxide, O

Role of the exosporial membrane in attachment and germination of C. sporogenes

1993 ◽  
Vol 51 ◽  
pp. 38-39
Author(s):  
B.J. Panessa-Warren ◽  
G.T. Tortora ◽  
J.B. Warren
Keyword(s):  
Enzymatic Degradation ◽  
Light Transmission ◽  
Extended Period ◽  
Growth Conditions ◽  
Clostridium Sporogenes ◽  
Radiation Chemical ◽  
Physical Trauma ◽  
Extended Contact ◽  
Cold Pressure

Some bacteria are capable of forming highly resistant spores when environmental conditions are not adequate for growth. Depending on the genus and species of the bacterium, these endospores are resistant in varying degrees to heat, cold, pressure, enzymatic degradation, ionizing radiation, chemical sterilants,physical trauma and organic solvents. The genus Clostridium, responsible for botulism poisoning, tetanus, gas gangrene and diarrhea in man, produces endospores which are highly resistant. Although some sporocides can kill Clostridial spores, the spores require extended contact with a sporocidal agent to achieve spore death. In most clinical situations, this extended period of treatment is not possible nor practical. This investigation examines Clostridium sporogenes endospores by light, transmission and scanning electron microscopy under various dormant and growth conditions, cataloging each stage in the germination and outgrowth process, and analyzing the role played by the exosporial membrane in the attachment and germination of the spore.

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