New method for measuring the laser-induced damage threshold of optical thin film

2012 ◽  
Author(s):  
Jun-hong Su ◽  
Hong Wang ◽  
Ying-xue Xi
Keyword(s):  
Thin Film ◽  
Damage Threshold ◽  
New Method ◽  
Optical Thin Film ◽  
Laser Induced Damage

Influence of negative ion element impurities on laser induced damage threshold of HfO2 thin film

2006 ◽  
Vol 253 (3) ◽  
pp. 1111-1115 ◽  
Author(s):  
ShiGang Wu ◽  
GuangLei Tian ◽  
ZhiLin Xia ◽  
JianDa Shao ◽  
ZhengXiu Fan
Keyword(s):  
Thin Film ◽  
Damage Threshold ◽  
Negative Ion ◽  
Laser Induced Damage

Design and fabrication of thin-film polarizer at wavelength of 1540 nm and investigation of its laser-induced damage threshold

2014 ◽  
Vol 129 (12) ◽  
Author(s):  
Masoume Sahraee ◽  
Hamid Reza Fallah ◽  
Badri Moradi ◽  
Hosein Zabolian ◽  
Morteza Haji Mahmoodzade
Keyword(s):  
Thin Film ◽  
Damage Threshold ◽  
Laser Induced Damage

Laser-induced damage threshold of thin film in a gas chamber

1999 ◽  
Author(s):  
Feng Huang ◽  
Qihong Lou ◽  
Hongyi Gao ◽  
Jinxing Dong ◽  
Yunrong Wei
Keyword(s):  
Thin Film ◽  
Damage Threshold ◽  
Laser Induced Damage ◽  
Gas Chamber

Using Amplified Spontaneous Emission Source to Test Damage Threshold of Optical Thin-Film

2014 ◽  
Vol 34 (8) ◽  
pp. 0814003
Author(s):  
周琼 Zhou Qiong ◽  
张志祥 Zhang Zhixiang ◽  
孙明营 Sun Mingying ◽  
姚玉东 Yao Yudong ◽  
彭宇杰 Peng Yujie ◽  
...  
Keyword(s):  
Thin Film ◽  
Spontaneous Emission ◽  
Damage Threshold ◽  
Amplified Spontaneous Emission ◽  
Emission Source ◽  
Optical Thin Film

scholarly journals The pulsed laser damage sensitivity of optical thin films, thermal conductivity

1989 ◽  
Vol 7 (3) ◽  
pp. 433-441 ◽  
Author(s):  
Arthur H. Guenther ◽  
John K. McIver
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Thermal Conductivity ◽  
Flow Analysis ◽  
Pulsed Laser ◽  
Damage Threshold ◽  
Deposition Process ◽  
Film Structure ◽  
Film Research ◽  
Laser Induced Damage

Pulsed laser induced damage of optical thin films is, in general, initiated by the absorption of laser radiation by imperfections in the films or at interfaces between film layers and/or the substrate. A heat flow analysis of this process stresses the importance that the thermal conductivity of both the thin film host and that of the substrate play in establishing the laser-induced damage threshold. Unfortunately, recent work, which will be reviewed in this presentation, indicates that the thermal conductivity of thin films can be several orders of magnitude lower than that of the corresponding material in bulk form. This situation arises as a consequence of the film structure resulting principally from the deposition process. The importance of thermal conductivity will be compared to parameters such as absorption mechanisms, film materials, composition, and other variables. Its implication for the ultimate optical strength of materials and the direction in which thin film research and processing should proceed will be highlighted.

Evaluation damage threshold of optical thin-film using an amplified spontaneous emission source

2014 ◽  
Author(s):  
Qiong Zhou ◽  
Mingying Sun ◽  
Zhixiang Zhang ◽  
Yudong Yao ◽  
Yujie Peng ◽  
...  
Keyword(s):  
Thin Film ◽  
Spontaneous Emission ◽  
Damage Threshold ◽  
Amplified Spontaneous Emission ◽  
Emission Source ◽  
Optical Thin Film
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