Resists For Use In 248 Nm Excimer Laser Lithography

1986 ◽  
Author(s):  
Kevin J. Orvek ◽  
Shane R. Palmer ◽  
Cesar M. Garza ◽  
Gene E. Fuller
Keyword(s):  
Excimer Laser ◽  
Laser Lithography

scholarly journals Resists Using the Absorption Band Shift Method for ArF Excimer Laser Lithography.

1998 ◽  
Vol 11 (3) ◽  
pp. 489-492
Author(s):  
Takeshi Okino ◽  
Koji Asakawa ◽  
Naomi Shida ◽  
Tohru Ushirogouchi
Keyword(s):  
Absorption Band ◽  
Excimer Laser ◽  
Band Shift ◽  
Shift Method ◽  
Laser Lithography ◽  
Arf Excimer Laser

Excimer laser lithography: Intensity-dependent resist damage

1986 ◽  
Vol 7 (9) ◽  
pp. 543-545 ◽  
Author(s):  
G.M. Davis ◽  
M.C. Gower
Keyword(s):  
Excimer Laser ◽  
Laser Lithography

Challenges in excimer laser lithography for 256M DRAM and beyond

1992 ◽  
Author(s):  
Endo ◽  
Hashimoto ◽  
Yamashita ◽  
Katsuyama ◽  
Matsuo ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Laser Lithography

ArF excimer laser lithography with bottom antireflective coating

1998 ◽  
Author(s):  
Shinji Kishimura ◽  
Makoto Takahashi ◽  
Keisuke Nakazawa ◽  
Takeshi Ohfuji ◽  
Masaru Sasago ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Antireflective Coating ◽  
Laser Lithography ◽  
Arf Excimer Laser

Dissolution behavior of alicyclic polymers designed for ArF excimer laser lithography

1996 ◽  
Author(s):  
Takeshi Ohfuji ◽  
Katsumi Maeda ◽  
Kaichiro Nakano ◽  
Etsuo Hasegawa
Keyword(s):  
Excimer Laser ◽  
Dissolution Behavior ◽  
Laser Lithography ◽  
Arf Excimer Laser
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