Focussed Excimer Laser Beams: A Technique For Selective Micropatterning

1988 ◽  
Author(s):  
Jean M. Hagerhorst ◽  
Modest M. Oprysko
Keyword(s):  
Excimer Laser ◽  
Laser Beams

Excimer Laser Induced Etching of Silicon-Carbide

1988 ◽  
Vol 129 ◽  
Author(s):  
M. Murahara ◽  
H. Arai ◽  
T. Matsumura
Keyword(s):  
Absorption Band ◽  
Laser Beam ◽  
Excimer Laser ◽  
Etching Rate ◽  
Laser Beams ◽  
Absorption Factor ◽  
Total Flow ◽  
Krf Laser ◽  
Krf Excimer Laser ◽  
Laser Induced Etching

ABSTRACTResistless photoetching of SiC was performed by using XeF and KrF excimer laser beams. In this method, ClF3 gas was used for etchant. C1F3 gas has a unique absorption band in the range of 300- 430 nm. The strongest absorption band corresponds to the wavelength of the XeF laser (350 nm). So C1F3 gas is decomposed effectively. On the other hand, the absorption factor of SiC is about 30% in the range of 200-400 nm, and the bonding energy of SiC is lower than the photon energy of the KrF laser beam. For these reasons, it is possible to cut the bond of SiC directly. Thus, two laser beams were used. Fluence of the KrF laser beam was 200 mJ/cm2, of the XeF, 50 mJ/cm2. Total flow rates through the cell were 0.05 1/min. We can fabricated the etched feature of reticle pattern by reductive projection. Line and space was 10 μm and etching rate was 50Å/pulse.

Diffractive shaping of excimer laser beams

2000 ◽  
Vol 47 (13) ◽  
pp. 2467-2475 ◽  
Author(s):  
J. Turunen ◽  
P. Pääkkönen ◽  
M. Kuittinen ◽  
P. Laakkonen ◽  
J. Simonen ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Laser Beams

Experimental and Theoretical Results of High Optical Quality Excimer Laser Beams

1996 ◽  
pp. 191-198
Author(s):  
S. Bollanti ◽  
P. Lazzaro ◽  
F. Flora ◽  
G. Giordano ◽  
T. Letardi ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Optical Quality ◽  
Laser Beams ◽  
High Optical Quality ◽  
Theoretical Results

scholarly journals Preparation of Semiconducting Polymer Films by High Intensity Photo-Chemical Processes with Excimer Laser Beams.

1997 ◽  
Vol 10 (2) ◽  
pp. 175-180 ◽  
Author(s):  
Satoru Nishio ◽  
Tetsuya Oba ◽  
Ryoko Mase ◽  
Akiyoshi Matsuzaki ◽  
Hiroyasu Sato
Keyword(s):  
Excimer Laser ◽  
Polymer Films ◽  
High Intensity ◽  
Chemical Processes ◽  
Laser Beams ◽  
Semiconducting Polymer

Theory concerning the ablation of corneal tissue with large-area, 193-nm excimer laser beams

2005 ◽  
Author(s):  
C. R. Munnerlyn ◽  
A. L. Munnerlyn ◽  
M. E. Arnoldussen ◽  
B. A. Logan
Keyword(s):  
Excimer Laser ◽  
Laser Beams ◽  
Corneal Tissue ◽  
Large Area ◽  
193 Nm

Theory Concerning the Ablation of Corneal Tissue with Large-Area, 193-nm Excimer Laser Beams

2005 ◽  
Author(s):  
Charles R. Munnerlyn ◽  
Mark E. Arnoldussen ◽  
Audrey L. Munnerlyn ◽  
Benjamin A. Logan
Keyword(s):  
Excimer Laser ◽  
Laser Beams ◽  
Corneal Tissue ◽  
Large Area ◽  
193 Nm

Pulsed laser deposition using diffractively shaped excimer-laser beams

2012 ◽  
Vol 108 (2) ◽  
pp. 423-430 ◽  
Author(s):  
V. Kekkonen ◽  
A. Hakola ◽  
J. Likonen ◽  
Y. Ge ◽  
T. Kajava
Keyword(s):  
Pulsed Laser Deposition ◽  
Excimer Laser ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Laser Beams
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