0.25 μm Periodic Structures For Lightwave Technology Fabricated By Spatial Frequency Doubling Lithography (SFDL)

1989 ◽  
Author(s):  
T. E. Jewell ◽  
J. H. Bennewitz ◽  
V. Pol ◽  
R. Cirelli
Keyword(s):  
Spatial Frequency ◽  
Periodic Structures ◽  
Frequency Doubling ◽  
Lightwave Technology

Observations on Spatial-Frequency Doubling

Perception ◽  
1974 ◽  
Vol 3 (1) ◽  
pp. 81-86 ◽  
Author(s):  
C W Tyler
Keyword(s):  
Spatial Frequency ◽  
Transient Response ◽  
Frequency Doubling ◽  
Amacrine Cells ◽  
Distortion Model ◽  
Detection Model ◽  
Disparity Detection

The involvement of disparity detectors in the perception of spatial-frequency doubling in a flickering grating was tested by viewing the grating horizontally. Frequency doubling was unimpaired, and must therefore occur independently of disparity detection. A distortion model of frequency doubling was compared with a flicker-detection model, in predicting the appearance of nonsinusoidal gratings. The results support the flicker-detection model but not the distortion model. Physiological considerations suggest that spatial-frequency doubling may be mediated by the transient response of the amacrine cells in the retina.

Insights for mfVEPs from perimetry using large spatial frequency-doubling and near frequency-doubling stimuli in glaucoma

2020 ◽  
Vol 141 (1) ◽  
pp. 45-55
Author(s):  
Siti Nurliyana Abdullah ◽  
Gordon F. Sanderson ◽  
Mohd Aziz Husni ◽  
Ted Maddess
Keyword(s):  
Spatial Frequency ◽  
Frequency Doubling

scholarly journals Ultrahigh spatial-frequency, high-contrast periodic structures produced by interference lithography

1996 ◽  
Author(s):  
H. T. Nguyen ◽  
J. A. Britten ◽  
R. D. Boyd ◽  
B. D. Shore ◽  
M. D. Perry
Keyword(s):  
Spatial Frequency ◽  
Periodic Structures ◽  
Interference Lithography ◽  
High Contrast

Deposition of Cr Atoms Using Switching-Detuning Light Mask for Direct Atom Lithography

2019 ◽  
Vol 15 (6) ◽  
pp. 626-630
Author(s):  
Li Zhu ◽  
Xiao Deng ◽  
Jie Liu ◽  
Xinbin Cheng ◽  
Tongbao Li
Keyword(s):  
Spatial Frequency ◽  
Deposition Time ◽  
Frequency Doubling ◽  
Deposition Process ◽  
Atom Beam ◽  
High Uniformity ◽  
Dipole Force ◽  
Scaling Down ◽  
Pitch Distance ◽  
Atom Lithography

Background: As progress on the nanofabrication has made semiconductor developed rapidly, there is an increasing need in precise pitch standards to calibrate the structure of devices at nanoscale. Nano-gratings fabricated by atom lithography are unique and suitable to act as precise pitch standard because its pitch distance is directly traceable to a natural constant. As the scaling down of nano-devices, it is very challenging to double the spatial frequency of nano-grating while keeping the self-traceability in atom lithography. Methods: In this study, the switching-detuning light mask is utilized for Cr atom lithography. During a single deposition process, the standing wave frequency is switching from positive detuning to negative detuning alternatively. Results: Nano-gratings fabricated using switching-detuning light mask is successfully replicated with double spatial frequency and self-traceability. Non-uniformity between neighboring Cr lines shows up with a corrected pitch of 107.15 Conclusion: Non-uniformity is mainly caused by the dipole force discrepancy between positive and negative detuning light mask. Therefore, to increase the high uniformity of nano-gratings, the deposition time of negative detuning should be at least twice as the positive detuning. On the other hand, to reduce the pitch uncertainty, it is necessary to reduce the distance between the atom beam and reflection mirror as close as possible. These two significant optimization designs are promising to increase the spatial frequency doubling performance with high uniformity and accuracy.

Spatial frequency doubling with two-step technique

2014 ◽  
Vol 39 (7) ◽  
pp. 2024
Author(s):  
Sensen Li ◽  
Lujian Chen ◽  
Xiaopeng Dong ◽  
Xuechang Ren ◽  
Xiangsu Zhang ◽  
...  
Keyword(s):  
Spatial Frequency ◽  
Frequency Doubling

Spatial Frequency Doubling Method by Image Superimposition for Sub-$\bf 0.15\mbox{-}{\mbi \mu }m$ Optical Lithography

1995 ◽  
Vol 34 (Part 1, No. 12A) ◽  
pp. 6518-6525
Author(s):  
Akihiro Otaka ◽  
Yoshio Kawai ◽  
Akinobu Tanaka ◽  
Tadahito Matsuda
Keyword(s):  
Spatial Frequency ◽  
Frequency Doubling ◽  
Optical Lithography ◽  
Doubling Method
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