scholarly journals Growth Of Diamond By Rf Plasma Assisted Chemical Vapor Deposition

1989 ◽  
Author(s):  
Duane E. Meyer ◽  
Natale J. Ianno ◽  
John A. Woollam ◽  
A. B. Swartzlander ◽  
A. J. Nelson
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Rf Plasma

Nanocrystalline Silicon Dots Fabricated by Pulse RF Plasma-Enhanced Chemical Vapor Deposition of SiCl4-and-H2Mixture

2003 ◽  
Vol 42 (Part 2, No. 10A) ◽  
pp. L1191-L1194 ◽  
Author(s):  
Hajime Shirai ◽  
Yasuhiro Seri ◽  
Haijun Jia ◽  
Ken-ichi Kurosaki
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Nanocrystalline Silicon ◽  
Rf Plasma

scholarly journals Growth of diamond by rf plasma-assisted chemical vapor deposition

1988 ◽  
Vol 3 (6) ◽  
pp. 1397-1403 ◽  
Author(s):  
Duane E. Meyer ◽  
Natale J. Ianno ◽  
John A. Woollam ◽  
A. B. Swartzlander ◽  
A. J. Nelson
Keyword(s):  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Gas Flow ◽  
Chemical Vapor ◽  
Input Power ◽  
Rf Plasma ◽  
Diamond Particles ◽  
Scanning Electron

A system has been designed and constructed to produce diamond particles by inductively coupled radio-frequency, plasma-assisted chemical vapor deposition. This is a low-pressure, low-temperature process used in an attempt to deposit diamond on substrates of glass, quartz, silicon, nickel, and boron nitride. Several deposition parameters have been varied including substrate temperature, gas concentration, gas pressure, total gas flow rate, rf input power, and deposition time. Analytical methods employed to determine composition and structure of the deposits include scanning electron microscopy, absorption spectroscopy, scanning Auger microprobe spectroscopy, and Raman spectroscopy. Analysis indicates that particles having a thin graphite surface, as well as diamond particles with no surface coatings, have been deposited. Deposits on quartz have exhibited optical bandgaps as high as 4 5 eV. Scanning electron microscopy analysis shows that particles are deposited on a pedestal which Auger spectroscopy indicates to be graphite. This is a phenomenon that has not been previously reported in the literature.

Chemical vapor deposition of diamond films from water vapor rf‐plasma discharges

1992 ◽  
Vol 60 (3) ◽  
pp. 329-331 ◽  
Author(s):  
R. A. Rudder ◽  
G. C. Hudson ◽  
J. B. Posthill ◽  
R. E. Thomas ◽  
R. C. Hendry ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Water Vapor ◽  
Vapor Deposition ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Rf Plasma ◽  
Plasma Discharges
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