<title>Laser Chemical Vapor Deposition Using Cw And Pulsed Lasers</title>

Laser Chemical Vapor Deposition Using Continuous Wave And Pulsed Lasers

Optical Engineering ◽

10.1117/12.7973320 ◽

1984 ◽

Vol 23 (4) ◽

Cited By ~ 12

Author(s):

S. D. Allen ◽

A. B. Trigubo ◽

Y. C. Liu

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Continuous Wave ◽

Chemical Vapor ◽

Pulsed Lasers ◽

Laser Chemical Vapor Deposition

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Influence of oxygen partial pressure on SmBa2Cu3O7-δ film deposited by laser chemical vapor deposition

Journal of Asian Ceramic Societies ◽

10.1080/21870764.2020.1860434 ◽

2020 ◽

pp. 1-11

Author(s):

Ting Wang ◽

Rong Tu ◽

Canlin Zhang ◽

Song Zhang ◽

Kaidong Wang ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Oxygen Partial Pressure ◽

Partial Pressure ◽

Vapor Deposition ◽

Chemical Vapor ◽

Laser Chemical Vapor Deposition

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Laser Chemical Vapor Deposition

Physical Processes in Laser-Materials Interactions ◽

10.1007/978-1-4684-4322-6_22 ◽

1983 ◽

pp. 455-468 ◽

Cited By ~ 2

Author(s):

Susan D. Allen

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Laser Chemical Vapor Deposition

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ArF excimer laser chemical vapor deposition a-Si:H/a-AlxO1−x superlattices

Thin Solid Films ◽

10.1016/0040-6090(92)90904-p ◽

1992 ◽

Vol 218 (1-2) ◽

pp. 62-67

Author(s):

K. Uwasawa ◽

F. Ishihara ◽

S. Matsumoto

Keyword(s):

Chemical Vapor Deposition ◽

Excimer Laser ◽

Vapor Deposition ◽

Chemical Vapor ◽

Laser Chemical Vapor Deposition ◽

Arf Excimer Laser

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Temperature controlled laser chemical vapor deposition (LCVD) using thermal imaging

Assembly Automation ◽

10.1108/01445150510626424 ◽

2005 ◽

Vol 25 (4) ◽

pp. 293-299 ◽

Cited By ~ 1

Author(s):

Daniel Jean ◽

W. Jack Lackey ◽

Chad E. Duty

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Thermal Imaging ◽

Chemical Vapor ◽

Laser Chemical Vapor Deposition ◽

Temperature Controlled

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High‐speed laser chemical vapor deposition of copper: A search for optimum conditions

Journal of Applied Physics ◽

10.1063/1.342817 ◽

1989 ◽

Vol 65 (6) ◽

pp. 2470-2474 ◽

Cited By ~ 30

Author(s):

B. Markwalder ◽

M. Widmer ◽

D. Braichotte ◽

H. van den Bergh

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

High Speed ◽

Chemical Vapor ◽

Optimum Conditions ◽

Laser Chemical Vapor Deposition

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Fast preparation of (111)-oriented β-SiC films without carbon formation by laser chemical vapor deposition from hexamethyldisilane without H2

Journal of the American Ceramic Society ◽

10.1111/jace.15315 ◽

2017 ◽

Vol 101 (4) ◽

pp. 1471-1478 ◽

Cited By ~ 4

Author(s):

Qingfang Xu ◽

Peipei Zhu ◽

Qingyun Sun ◽

Rong Tu ◽

Song Zhang ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Formation ◽

Laser Chemical Vapor Deposition ◽

Sic Films

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Laser Chemical Vapor Deposition-Applications In Materials Processing

10.1117/12.958020 ◽

1980 ◽

Cited By ~ 2

Author(s):

S. D. Allen

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Materials Processing ◽

Laser Chemical Vapor Deposition

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Preparation of the c-axis oriented AlN film by laser chemical vapor deposition using a newly proposed Al(acac)3 precursor

Journal of Crystal Growth ◽

10.1016/j.jcrysgro.2012.12.034 ◽

2013 ◽

Vol 365 ◽

pp. 1-5 ◽

Cited By ~ 3

Author(s):

Yu You ◽

Akihiko Ito ◽

Rong Tu ◽

Takashi Goto

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Laser Chemical Vapor Deposition ◽

Aln Film

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Fractal growth of sp3-bonded 5H-BN microcones by plasma-assisted laser chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.2205612 ◽

2006 ◽

Vol 99 (12) ◽

pp. 123512 ◽

Cited By ~ 8

Author(s):

Shojiro Komatsu ◽

Daisuke Kazami ◽

Hironori Tanaka ◽

Yusuke Moriyoshi ◽

Masaharu Shiratani ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Laser Chemical Vapor Deposition ◽

Fractal Growth

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