Printed assembly of micro/nanostructured semiconductor materials for high-performance unusual format photovoltaics

2012 ◽  
Author(s):  
Jongseung Yoon
2014 ◽  
Vol 2 (5) ◽  
pp. 619-626 ◽  
Author(s):  
John Zimmerman ◽  
Ramya Parameswaran ◽  
Bozhi Tian

Nanostructured semiconductor materials and devices hold great promise as unique biomaterials to advance biophysics, biology and medicine.


2020 ◽  
Vol 10 (1) ◽  
Author(s):  
Ju-Hung Chen ◽  
Sheng-Kuei Chiu ◽  
Jin-De Luo ◽  
Shu-Yu Huang ◽  
Hsiang-An Ting ◽  
...  

Abstract Despite significant progress in the fabrication and application of semiconductor materials for optical emitters and sensors, few materials can cover the cyan-gap between 450 and 500 nm. We here introduce a robust and facile method to deposit amorphous Sb2S3 films with a bandgap of 2.8 eV. By exploiting the tunable functionality of graphene, a two-dimensional material, efficient deposition from a chemical was achieved. Ozone-generated defects in the graphene were shown to be required to enhance the morphology and quality of the material and comprehensive characterization of the seed layer and the Sb2S3 film were applied to design an optimal deposition process. The resulting material exhibits efficient carrier transport and high photodetector performance as evidenced by unprecedented responsivity and detectivity in semiconductor/graphene/glass vertical heterostructures. (112 A/W, 2.01 × 1012 Jones, respectively).


1996 ◽  
Vol 421 ◽  
Author(s):  
J. C. Zolper ◽  
A. G. Baca ◽  
M. E. Sherwin ◽  
J. F. Klem

AbstractIon implantation has been an enabling technology for the realization of many high performance electronic devices in III-V semiconductor materials. We report on advances in ion implantation processing technology for application to GaAs JFETs, AlGaAs/GaAs HFETs, and InGaP or InA1P-barrier HFETs. In particular, the GaAs JFET has required the development of shallow p-type implants using Zn or Cd with junction depths down to 35 nm after the activation anneal. Implant activation and ionization issues for AlGaAs will be reported along with those for InGaP and InAlP. A comprehensive treatment of Si-implant doping of AlGaAs is given based on the donor ionization energies and conduction band density-of-states dependence on Al-composition. Si and Si+P implants in InGaP are shown to achieve higher electron concentrations than for similar implants in AlGaAs due to the absence of the deep donor (DX) level. An optimized P co-implantation scheme in InGaP is shown to increase the implanted donor saturation level by 65%.


2017 ◽  
Vol 10 (7) ◽  
pp. 1610-1620 ◽  
Author(s):  
Yongxi Li ◽  
Lian Zhong ◽  
Bhoj Gautam ◽  
Hai-Jun Bin ◽  
Jiu-Dong Lin ◽  
...  

Low-bandgap polymers/molecules are an interesting family of semiconductor materials, and have enabled many recent exciting breakthroughs in the field of organic electronics, especially for organic photovoltaics (OPVs).


2017 ◽  
Vol 2017 ◽  
pp. 1-1
Author(s):  
Gengxin Zhang ◽  
Xin Zhang ◽  
Javad Foroughi ◽  
Jimin Yao ◽  
Jia Liu

2015 ◽  
Vol 17 (17) ◽  
pp. 11156-11160 ◽  
Author(s):  
Dhritabrata Mandal ◽  
Thomas W. Hamann

The Burstein–Moss shift is utilized to determine the absolute band positions of nanostructured semiconductor materials and the extinction coefficient of free conduction band electrons.


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