Current status of EUV mask inspection using 193nm optical inspection system in 30nm node and beyond

Author(s):  
Sang Hoon Han ◽  
Jihoon Na ◽  
Wonil Cho ◽  
Dong Hoon Chung ◽  
Chan-Uk Jeon ◽  
...  
1996 ◽  
pp. 439-474
Author(s):  
A. R. Rao ◽  
N. Ramesh ◽  
F. Y. Wu ◽  
J. R. Mandeville ◽  
P. Kerstens

Author(s):  
Carlos Bermudez ◽  
Ferran Laguarta ◽  
Cristina Cadevall ◽  
Aitor Matilla ◽  
Sergi Ibañez ◽  
...  

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