Low-loss HR coatings on fused silica substrates for 193 nm micro-lithography applications

2008 ◽  
Author(s):  
Sven Laux ◽  
Helmut Bernitzki ◽  
Dieter Fasold ◽  
Michael Klaus ◽  
Uwe Schuhmann
Keyword(s):  
Fused Silica ◽  
Low Loss ◽  
Hr Coatings ◽  
193 Nm ◽  
Silica Substrates

Densification of fused silica under 193-nm excitation

1997 ◽  
Vol 14 (7) ◽  
pp. 1606 ◽  
Author(s):  
N. F. Borrelli ◽  
Charlene Smith ◽  
Douglas C. Allan ◽  
T. P. Seward
Keyword(s):  
Fused Silica ◽  
193 Nm

Long-term 193-nm laser-induced degradation of fused silica and calcium fluoride

1999 ◽  
Author(s):  
Vladimir Liberman ◽  
Mordechai Rothschild ◽  
Jan H. C. Sedlacek ◽  
Ray S. Uttaro ◽  
Allen K. Bates ◽  
...  
Keyword(s):  
Calcium Fluoride ◽  
Fused Silica ◽  
193 Nm

scholarly journals STUDY OF FILMS OF TRANSITION METALS AS MATERIALS FOR LASER NANOSTRUCTURING

2021 ◽  
Vol 8 ◽  
pp. 241-247
Author(s):  
Roman I. Kuts ◽  
Victor P. Korolkov ◽  
Vladimir N. Khomutov ◽  
Anatoly I. Malyshev ◽  
Sergey L. Mikerin
Keyword(s):  
Thin Films ◽  
Transition Metals ◽  
Fused Silica ◽  
Point Of View ◽  
Direct Laser Writing ◽  
Periodic Nanostructures ◽  
Laser Writing ◽  
Oxide Nanostructures ◽  
Direct Laser ◽  
Silica Substrates

This paper presents the results of a study of direct laser writing on thin films of transition metals (Hf, Ti, Zr, Ta, V). The films were deposited on fused silica substrates. A comparison of laser writing on the indicated films is carried out from the point of view of the presence of contour writing. As it was proved earlier, when writing on zirconium films, contour writing leads to formation of periodic nanostructures with a period equal to the writing step (250-500 nm). Materials were identified that are promising from the point of view of writing oxide nanostructures for the further formation of the diffraction phase microrelief of DOEs.

Research on the Fabrication of Micro Channels in Fused Silica Substrates by Laser-Induced Plasma

2013 ◽  
Vol 50 (11) ◽  
pp. 111403
Author(s):  
李世雄 Li Shixiong ◽  
白忠臣 Bai Zhongchen ◽  
陈德良 Chen Deliang ◽  
秦水介 Qin Shuijie
Keyword(s):  
Fused Silica ◽  
Laser Induced Plasma ◽  
Micro Channels ◽  
Silica Substrates

Contamination of TiO2 thin films spin coated on rutile and fused silica substrates

2018 ◽  
Vol 354 ◽  
pp. 369-382 ◽  
Author(s):  
I.I. Kabir ◽  
L.R. Sheppard ◽  
R. Liu ◽  
Y. Yao ◽  
Q. Zhu ◽  
...  
Keyword(s):  
Thin Films ◽  
Fused Silica ◽  
Tio2 Thin Films ◽  
Silica Substrates

scholarly journals Traceable Coplanar Waveguide Calibrations on Fused Silica Substrates up to 110 GHz

2019 ◽  
Vol 67 (6) ◽  
pp. 2423-2432 ◽  
Author(s):  
Uwe Arz ◽  
Karsten Kuhlmann ◽  
Thorsten Dziomba ◽  
Gerd Hechtfischer ◽  
Gia Ngoc Phung ◽  
...  
Keyword(s):  
Coplanar Waveguide ◽  
Fused Silica ◽  
Silica Substrates

scholarly journals Argon plasma etching of fused silica substrates for manufacturing high laser damage resistance optical interference coatings

2017 ◽  
Vol 7 (10) ◽  
pp. 3598 ◽  
Author(s):  
Kęstutis Juškevičius ◽  
Rytis Buzelis ◽  
Giedrius Abromavičius ◽  
Romanas Samuilovas ◽  
Saulė Abbas ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Argon Plasma ◽  
Fused Silica ◽  
Laser Damage ◽  
Optical Interference ◽  
Damage Resistance ◽  
High Laser ◽  
Silica Substrates

scholarly journals Bulk scattering properties of synthetic fused silica at 193 nm

2006 ◽  
Vol 14 (22) ◽  
pp. 10537 ◽  
Author(s):  
Sven Schröeder ◽  
Mathias Kamprath ◽  
Angela Duparré ◽  
Andreas Tünnermann ◽  
Bodo Kühn ◽  
...  
Keyword(s):  
Fused Silica ◽  
Bulk Scattering ◽  
193 Nm
Sign in / Sign up

Export Citation Format

Share Document