Effect of annealing temperature on the structural and optical properties of Al-doped ZnO films by RF magnetron sputtering

2008 ◽  
Author(s):  
Yuebo Wu ◽  
Bo Huang ◽  
Liangtang Zhang ◽  
Suntao Wu
Keyword(s):  
Optical Properties ◽  
Magnetron Sputtering ◽  
Annealing Temperature ◽  
Rf Magnetron Sputtering ◽  
Zno Films ◽  
Structural And Optical Properties ◽  
Doped Zno

Spectroscopic ellipsometric determination of optical properties of V-Al co-doped ZnO films by rf magnetron sputtering

2013 ◽  
Vol 30 (4) ◽  
pp. 221-227 ◽  
Author(s):  
A. Sayari ◽  
L. El Mir ◽  
S. Al-Heniti ◽  
E. Shalaan ◽  
S. J. Yaghmour ◽  
...  
Keyword(s):  
Optical Properties ◽  
Magnetron Sputtering ◽  
Rf Magnetron Sputtering ◽  
Zno Films ◽  
Doped Zno ◽  
Co Doped

The Effect of Target to Substrate Distance on the Properties of HAZO Films Deposited by Magnetron Sputtering

2011 ◽  
Vol 685 ◽  
pp. 134-140 ◽  
Author(s):  
Wei Ming Lu ◽  
Jun Zhang ◽  
Hong Wei Diao ◽  
Lei Zhao ◽  
Wen Jing Wang
Keyword(s):  
Residual Stress ◽  
Grain Size ◽  
Optical Properties ◽  
Magnetron Sputtering ◽  
Systematic Study ◽  
Rf Magnetron Sputtering ◽  
Zno Films ◽  
Electrical And Optical Properties ◽  
Substrate Distance ◽  
Doped Zno

Hydrogen doped AZO films (HAZO) were prepared by RF magnetron sputtering. A systematic study of the effect of substrate to target distance (Dst) on the structural, electrical and optical properties of the as-grown HAZO films was carried out. Compared with the Al-doped ZnO films, the hydrogen in the atmosphere influenced the growth of the films by incorporating in the films and bombarding the surface of the film, namely, the Dst, which induced the residual stress and the roughness of the films decreasedwith an increase of the Dst. The films showed a smaller grain size. The surfacework function of the films changed with the composition of the films, reaching a maximum at 7.5cm.

Role of Sputtering Power on the Structural and Optical Properties of ZnO/SiO2 Films Deposited by Radio Frequency Magnetron Sputtering

2013 ◽  
Vol 760-762 ◽  
pp. 776-779
Author(s):  
Shuang Li ◽  
Ming Chen ◽  
Feng Xiang Wang
Keyword(s):  
Optical Properties ◽  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Rf Magnetron Sputtering ◽  
Zno Films ◽  
X Ray Diffraction ◽  
Structural And Optical Properties ◽  
Force Microscopy ◽  
Sputtering Power

In the present work, we investigated the effect of sputtering power on the structural and optical properties of ZnO films by radio frequency (rf) magnetron sputtering. Atom force microscopy (AFM), X-ray diffraction (XRD) and Prism coupling method were adopted to investigate the structure and optical properties of ZnO thin films deposited by sputtering powers in the range from 100~150W. XRD and AFM results shown that ZnO films with high c-axis preferred orientation crystalline structures have been successfully deposited under higher sputtering power condition. Moreover, it was also found that the indexes refractive of the films obtained by higher sputtering power are less than that of the bulk ZnO materials, which is closer to Crystal Refractive index.

Structural and optical properties of La-doped ZnO films prepared by magnetron sputtering

2007 ◽  
Vol 61 (11-12) ◽  
pp. 2262-2265 ◽  
Author(s):  
Wei Lan ◽  
Yanping Liu ◽  
Ming Zhang ◽  
Bo Wang ◽  
Hui Yan ◽  
...  
Keyword(s):  
Optical Properties ◽  
Magnetron Sputtering ◽  
Zno Films ◽  
Structural And Optical Properties ◽  
Doped Zno ◽  
La Doped
Sign in / Sign up

Export Citation Format

Share Document