Research on the measuring method of the slope error of EUV/x-ray optical elements and measuring apparatus of long trace profiler

2007 ◽  
Author(s):  
Changxi Xue ◽  
Furong Huo ◽  
Chengzhi Zhou ◽  
Weicai Deng
Keyword(s):  
Measuring Method ◽  
Measuring Apparatus ◽  
Optical Elements ◽  
X Ray ◽  
Slope Error

Comparison of monochromators with a bent parabolic mirror and a varied-spacing grating for the 2.0 GeV high-brilliance synchrotron radiation source (VSX)

1998 ◽  
Vol 5 (3) ◽  
pp. 817-819
Author(s):  
K. Mashima ◽  
N. Kihara ◽  
E. Ishiguro
Keyword(s):  
Synchrotron Radiation ◽  
Vacuum Ultraviolet ◽  
Grazing Incidence ◽  
The Other ◽  
Resolving Power ◽  
Parabolic Mirror ◽  
Optical Elements ◽  
X Ray ◽  
Electron Positron ◽  
Slope Error

A design study of monochromators for a 2.0 GeV electron/positron storage ring for high-brilliance synchrotron radiation in the vacuum ultraviolet (VUV) and the soft X-ray regions is described. Two types of VUV/soft X-ray grazing-incidence monochromators, one with a bent parabolic mirror and the other with a varied-spacing grating, are designed. Without any slope error, the expected resolving power of the former is much higher, but the latter is less affected by slope errors of the optical elements.

Preliminary experience of optical elements fabrication by X-ray lithography

1995 ◽  
Vol 359 (1-2) ◽  
pp. 412-414 ◽  
Author(s):  
E.G Churin ◽  
V.P Koronkevich ◽  
G.N Kulipanov ◽  
O.A Makarov ◽  
L.A Mezentseva ◽  
...  
Keyword(s):  
Optical Elements ◽  
X Ray

scholarly journals Novel measuring method of urethane-foam mattress deformation using X-ray CT

2018 ◽  
Vol 84 (859) ◽  
pp. 17-00443-17-00443
Author(s):  
Takashi FUNAI ◽  
Hideo YOKOTA ◽  
Yasumasa HAKAMATA ◽  
Kazuaki FUKASAKU ◽  
Ryutaro HIMENO ◽  
...  
Keyword(s):  
Measuring Method ◽  
Urethane Foam ◽  
X Ray

Laser-induced damage studies in optical elements using X-ray laser interferometric microscopy

2009 ◽  
Author(s):  
D. Margarone ◽  
M. Kozlova ◽  
J. Nejdl ◽  
B. Rus ◽  
T. Mocek ◽  
...  
Keyword(s):  
Optical Elements ◽  
X Ray ◽  
Laser Induced Damage ◽  
Laser Interferometric

X-ray investigation of strained epitaxial layer systems by reflections in skew geometry

2017 ◽  
Vol 50 (2) ◽  
pp. 475-480 ◽  
Author(s):  
Peter Zaumseil
Keyword(s):  
Complex Analysis ◽  
Reciprocal Lattice ◽  
Angular Divergence ◽  
Reciprocal Space Mapping ◽  
Reciprocal Lattice Point ◽  
Optical Elements ◽  
Diffraction Curve ◽  
X Ray ◽  
Layer Parameter ◽  
Layer Structures

Four different SiGe/Si layer structures, pseudomorphically grown and (partially) relaxed, are used as examples to demonstrate that reflections in symmetric skew geometry can successfully be used to realize a complex analysis of these systems. Taking the intensity exactly along the truncation rod of a reciprocal lattice point, it is possible to simulate this diffraction curve and determine the layer parameter in the projection according to the netplane tilt relative to the surface. The main precondition for this technique and for performing reciprocal space mapping with sufficiently high resolution is a low angular divergence of the incident and detected beams perpendicular to the diffraction plane, which can also be achieved by suitable optical elements on laboratory-based diffractometers.

Conserving the Coherence and Uniformity of Third-Generation Synchrotron Radiation Beams: the Case of ID19, a `Long' Beamline at the ESRF

1998 ◽  
Vol 5 (5) ◽  
pp. 1243-1249 ◽  
Author(s):  
José I. Espeso ◽  
Peter Cloetens ◽  
José Baruchel ◽  
Jürgen Härtwig ◽  
Trevor Mairs ◽  
...  
Keyword(s):  
Synchrotron Radiation ◽  
Phase Contrast ◽  
Angular Size ◽  
Third Generation ◽  
Optical Elements ◽  
X Ray ◽  
Front End ◽  
Ray Path ◽  
Radiation Beams

The lateral coherence length is of the order of 100 µm at the `long' (145 m) ID19 beamline of the ESRF, which is mainly devoted to imaging. Most of the optical elements located along the X-ray path can thus act as `phase objects', and lead to spurious contrast and/or to coherence degradation, which shows up as an enhanced effective angular size of the source. Both the spurious contrast and the coherence degradation are detrimental for the images (diffraction topographs, tomographs, phase-contrast images) produced at this beamline. The problems identified and the way they were solved during the commissioning of ID19 are reported. More particularly, the role of the protection foils located in the front end, the beryllium windows, the filters and the monochromator defects (scratches, dust, small vibrations) is discussed.

scholarly journals Elliptically Bent X-Ray Mirrors with Active Temperature Stabilization

2010 ◽  
Vol 2010 ◽  
pp. 1-9 ◽  
Author(s):  
Sheng Yuan ◽  
Matthew Church ◽  
Valeriy V. Yashchuk ◽  
Kenneth A. Goldberg ◽  
Richard S. Celestre ◽  
...  
Keyword(s):  
Laboratory Testing ◽  
High Heat ◽  
Temperature Stabilization ◽  
Surface Slope ◽  
Peltier Element ◽  
X Ray ◽  
Slope Error ◽  
Temperature Controlled ◽  
Active Mirror ◽  
Active Temperature

We present details of design of elliptically bent Kirkpatrick-Baez mirrors developed and successfully used at the advanced light source for submicron focusing. A distinctive feature of the mirror design is an active temperature stabilization based on a Peltier element attached directly to the mirror body. The design and materials have been carefully optimized to provide high heat conductance between the mirror body and substrate. We describe the experimental procedures used when assembling and precisely shaping the mirrors, with special attention paid to laboratory testing of the mirror-temperature stabilization. For this purpose, the temperature dependence of the surface slope profile of a specially fabricated test mirror placed inside a temperature-controlled container was measured. We demonstrate that with active mirror-temperature stabilization, a change of the surrounding temperature by more than 3 K does not noticeably affect the mirror figure. Without temperature stabilization, the rms slope error is changed by approximately 1.5 μrad (primarily defocus) under the same conditions.

scholarly journals Scratch-Profiles Study in Thin Films Using SEM and EDS

1984 ◽  
Vol 11 (3) ◽  
pp. 237-241 ◽  
Author(s):  
M. El-Shabasy ◽  
L. Pogány ◽  
G. Konczos ◽  
E. Hajtó ◽  
B. Szikora
Keyword(s):  
Thin Films ◽  
Surface Morphology ◽  
Critical Load ◽  
Conventional Method ◽  
Experimental Work ◽  
Measuring Method ◽  
Shearing Stress ◽  
Line Profiles ◽  
X Ray ◽  
Thickness Profile

The adhesion of evaporated or sputtered thin films to substrates is one of the most important characterising parameters in their fabrication. It is a conventional method to scratch the films using a stylus and evaluate the shearing stress, which is proportional to the energy of adhesion. For the evaluation it is necessary to determine the so-called critical load and the profile of the scratch.The aim during this experimental work was to find a method to evaluate the scratch profile from the X-ray-line profile and SEM pictures. From SEM pictures, the lateral dimensions and surface morphology of the scratches were studied. The thickness was also studied from X-ray-line profiles.In this paper the thickness profile measuring method and the conclusion for the scratch method are discussed.

The Experimental Study of Diffraction Angle of Aluminum Alloy 3003

2012 ◽  
Vol 625 ◽  
pp. 291-296
Author(s):  
Neng Quan Duan ◽  
Jian Liang Ren ◽  
Rui Qiang Pang
Keyword(s):  
Residual Stress ◽  
Aluminum Alloy ◽  
Stress Measurement ◽  
Electrical Measuring ◽  
Diffraction Method ◽  
Measuring Method ◽  
X Ray ◽  
Equal Strength ◽  
Diffraction Angle ◽  
Stress Measuring

The most suitable diffraction angle of aluminum alloy 3003 used for stress measuring is aimed to be determined in this paper. The experiment makes a stress measurement of a loading aluminum alloy 3003 equal strength beam with the traditional electrical measuring method and the X-ray stress measurement. With the electrical measuring method as reference, the research study the measured values that acquired from the X-ray diffraction method when the diffraction angle are 142° and 156°, and then compare them with that acquired from electrical measuring method. The measurement results demonstrate that the diffraction angle at 156 ° is better than at 142 ° based on the assessment standards of the liner slope and the distribution of data. Thus the optimum diffraction angle for X-ray to measure the macroscopic stress of aluminum alloy 3003 is 156 °. In this paper，the stress caused by the load on the equal strength beam is assumed to be "residual stress" and thus the conclusion has reference values for the standardization of residual stress measurement of aluminum alloy by XRD and has theoretical guiding significance in the production practices.

Holfelder's field voter demonstrations

1930 ◽  
Vol 26 (9) ◽  
pp. 947-947
Author(s):  
R. Gasul
Keyword(s):  
Personal Experience ◽  
Measuring Method ◽  
X Ray

Meeting on December 26, 1929 R. Gasul. Demonstration of Holfelder's voter field, his method of irradiation in deep X-ray therapy. The speaker notes the great importance of this method in teaching X-ray therapy. The young radiologist learns about precise dosage and measurement and, with the help of special templates, an accurate understanding of incorrect installation and the associated burn hazard. In conclusion, the speaker reported on his personal experience with Holfelder's measuring method, which he met during a visit to the X-ray Institute in Frankfurt headed by N. Holfelde (in 1927). - Debate: Segal, Formozov, Margolis, Gefen.

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