Non-chemically amplified resists for 193 nm lithography

2008 ◽  
Author(s):  
Isao Nishimura ◽  
William H. Heath ◽  
Kazuya Matsumoto ◽  
Wei-Lun Jen ◽  
Saul S. Lee ◽  
...  
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Resists ◽  
193 Nm

Refractive index change during exposure for 193-nm chemically amplified resists

1999 ◽  
Author(s):  
Hye-Keun Oh ◽  
Young-Soo Sohn ◽  
Moon-Gyu Sung ◽  
Young-Mi Lee ◽  
Eun-Mi Lee ◽  
...  
Keyword(s):  
Refractive Index ◽  
Refractive Index Change ◽  
Index Change ◽  
Chemically Amplified ◽  
Chemically Amplified Resists ◽  
193 Nm

Acid amplification of chemically amplified resists for 193-nm lithography

1997 ◽  
Author(s):  
Takeshi Ohfuji ◽  
Makoto Takahashi ◽  
Koichi Kuhara ◽  
Tohru Ogawa ◽  
Hiroshi Ohtsuka ◽  
...  
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Resists ◽  
193 Nm

scholarly journals Characterization of Chemically Amplified Resists with "Acid Amplifier" for 193 nm Lithography.

1997 ◽  
Vol 10 (4) ◽  
pp. 551-558 ◽  
Author(s):  
Takeshi Ohfuji ◽  
Makoto Takahashi ◽  
Masaru Sasago ◽  
Soh Noguchi ◽  
Kunihiro Ichimura
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Resists ◽  
193 Nm ◽  
Acid Amplifier

Environmental stability of 193 nm single layer chemically amplified resists

1999 ◽  
Vol 17 (1) ◽  
pp. 101 ◽  
Author(s):  
A. G. Timko ◽  
F. M. Houlihan ◽  
R. A. Cirelli ◽  
O. Nalamasu ◽  
Hiroshi Yoshino ◽  
...  
Keyword(s):  
Single Layer ◽  
Environmental Stability ◽  
Chemically Amplified ◽  
Chemically Amplified Resists ◽  
193 Nm

Modeling chemically amplified resists for 193-nm lithography

2000 ◽  
Author(s):  
Ebo H. Croffie ◽  
Mosong Cheng ◽  
Andrew R. Neureuther ◽  
Francis M. Houlihan ◽  
Raymond A. Cirelli ◽  
...  
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Resists ◽  
193 Nm

scholarly journals Non-chemically amplified resists for 193-nm immersion lithography: influence of absorbance on performance

2010 ◽  
Author(s):  
Lan Chen ◽  
Yong-Keng Goh ◽  
Kirsten Lawrie ◽  
Bruce Smith ◽  
Warren Montgomery ◽  
...  
Keyword(s):  
Immersion Lithography ◽  
Chemically Amplified ◽  
Chemically Amplified Resists ◽  
193 Nm

Dissolution Inhibitors for 193-nm Chemically Amplified Resists

1997 ◽  
Vol 36 (Part 1, No. 12B) ◽  
pp. 7625-7631
Author(s):  
Tohru Ushirogouchi ◽  
Koji Asakawa ◽  
Takeshi Okino ◽  
Naomi Shida ◽  
Naoko Kihara ◽  
...  
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Resists ◽  
193 Nm

Novel functional nortricyclene polymers and copolymers for 248- and 193-nm chemically amplified resists

1997 ◽  
Author(s):  
Qingshang J. Niu ◽  
Jean M. J. Frechet ◽  
Uzodinma Okoroanyanwu ◽  
Jeff D. Byers ◽  
C. Grant Willson
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Resists ◽  
193 Nm

Understanding the Exposure Process in the Extreme Ultra Violet Lithography

2021 ◽  
Vol 21 (8) ◽  
pp. 4466-4469
Author(s):  
Sang-Kon Kim
Keyword(s):  
Extreme Ultraviolet ◽  
Ultra Violet ◽  
Chemically Amplified ◽  
Euv Lithography ◽  
Metal Organic ◽  
Deep Ultraviolet ◽  
Chemically Amplified Resists ◽  
193 Nm ◽  
Physical And Chemical ◽  
Exposure Process

Although being the optical lithography, the extreme ultraviolet (EUV) lithography with 13.5-nm wavelength is very different from the deep ultraviolet (DUV) lithography with 193-nm wavelength. Hence, the understanding of the complex detailed EUV mechanisms to cause a chemical reaction in chemically amplified resists (CARs) is required to develop EUV resists and exposure process. In this paper, for organic, metal-organic and metal-oxide resists, the electron-scattering model of exposure mechanisms needs to include the elastic and inelastic mean free paths. On top of that, Dill’s parameters of DUV and EUV resisters from the photo-generated reaction are discussed to indicate the physical and chemical characteristics. For CAR and EUV resists, Dill B parameter is large than Dill A and B parameters.

Quantum Yields of Photoacid Generation in 193-nm Chemically Amplified Resists by Fluorescence Imaging Spectroscopy

2004 ◽  
Vol 16 (26) ◽  
pp. 5726-5730 ◽  
Author(s):  
Krishanu Ray ◽  
Michael D. Mason ◽  
Robert D. Grober ◽  
Gerd Pohlers ◽  
Carolyne Staford ◽  
...  
Keyword(s):  
Fluorescence Imaging ◽  
Imaging Spectroscopy ◽  
Quantum Yields ◽  
Chemically Amplified ◽  
Chemically Amplified Resists ◽  
193 Nm
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