Study on the MEMS technique of flat capacitance sensor with double equipotential rings in ultra-precise optical measurement

2007 ◽  
Author(s):  
Xiao-dong Yang ◽  
Jian-huan Zhang
Author(s):  
Jianhuan Zhang ◽  
Xuemin Gao ◽  
Xiaodong Yang

Measurements based on all sorts of optical methods in mechanical engineering area had been extensively studied, and in these measurements, many sensors, such as capacitance, are often applied to detect the focusing displacement of objective. For improving the edge effect of the plate capacitance, an equipotential ring is applied. Following the Abbe rule, a plate capacitance sensor with double equipotential rings and a central hole is introduced. The axis of the optical system perforates through the hole of the sensor, thus no Abbe error occurs. If the capacitance sensor is manufactured with machine tools, the gap between the equipotential ring and the orbicular electrode can not be narrow enough, meanwhile, the assembly becomes difficulty. In order to get narrow gap as well as thin electrodes, PCB process is tried to make the capacitance electrodes, but the gap between the equipotential ring and the electrode can only be about 0.1mm. When MEMS technique is introduced, the gap can be about 2μm. Although the cost is by far the higher than that made with PCB, the linear error as well as the measurement accuracy can be promoted greatly. After the circuit is designed, test of the capacitance sensor made with MEMS is completed, and the result that linear error is less than 0.05% and the sensitivity is 1mV/nm is presented with displacement of 30μm.


2016 ◽  
Vol 136 (10) ◽  
pp. 1420-1421
Author(s):  
Yusuke Tanaka ◽  
Yuji Nagaoka ◽  
Hyeon-Gu Jeon ◽  
Masaharu Fujii ◽  
Haruo Ihori

2010 ◽  
Vol 130 (4) ◽  
pp. 313-318
Author(s):  
Makoto Kanemaru ◽  
Shohei Sorimachi ◽  
Shinji Ibuka ◽  
Shozo Ishii

2019 ◽  
Author(s):  
R. Distl ◽  
J. Schütte ◽  
G. Sauter ◽  
T. Bergen ◽  
T. Goodman ◽  
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Keyword(s):  

Author(s):  
Julian Wüster ◽  
Yannick Bourgin ◽  
Patrick Feßer ◽  
Arne Behrens ◽  
Stefan Sinzinger

AbstractPolarizing beamsplitters have numerous applications in optical systems, such as systems for freeform surface metrology. They are classically manufactured from birefringent materials or with stacks of dielectric coatings. We present a binary subwavelength-structured form-birefringent diffraction grating, which acts as a polarizing beamsplitter for a wide range of incidence angles −30∘…+30∘. We refine the general design method for such hybrid gratings. We furthermore demonstrate the manufacturing steps with Soft-UV-Nanoimprint-Lithography, as well as the experimental verification, that the structure reliably acts as a polarizing beamsplitter. The experimental results show a contrast in efficiency for TE- and TM-polarization of up to 1:18 in the first order, and 34:1 in the zeroth order. The grating potentially enables us to realize integrated compact optical measurement systems, such as common-path interferometers.


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