Immersion defect reduction, part II: the formation mechanism and reduction of patterned defects
Defect reduction in oxygen implanted silicon-on-insulator material during high-temperature annealing
1989 ◽
Vol 47
◽
pp. 604-605
Study of nanoalloys formation mechanism from single-source precursors [M(NH3)5Cl](ReO4)2, M = Rh, Ir
2007 ◽
Vol 2007
(suppl_26)
◽
pp. 283-288
◽
2015 ◽
Vol 9
(6)
◽
pp. 536
◽