scholarly journals Three-dimensional diffractive micro- and nano-optical elements fabricated by electron-beam lithography

2007 ◽  
Author(s):  
Ivan B. Divliansky ◽  
Eric G. Johnson
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Three Dimensional ◽  
Optical Elements

scholarly journals Nanooptical elements for visual verification

2021 ◽  
Vol 11 (1) ◽  
Author(s):  
Alexander Goncharsky ◽  
Anton Goncharsky ◽  
Dmitry Melnik ◽  
Svyatoslav Durlevich
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Mass Production ◽  
Optical Element ◽  
Visual Image ◽  
Zero Order ◽  
Diffractive Optical Elements ◽  
Optical Elements ◽  
Standard Equipment ◽  
Diffractive Element

AbstractThis paper focuses on the development of flat diffractive optical elements (DOEs) for protecting banknotes, documents, plastic cards, and securities against counterfeiting. A DOE is a flat diffractive element whose microrelief, when illuminated by white light, forms a visual image consisting of several symbols (digits or letters), which move across the optical element when tilted. The images formed by these elements are asymmetric with respect to the zero order. To form these images, the microrelief of a DOE must itself be asymmetric. The microrelief has a depth of ~ 0.3 microns and is shaped with an accuracy of ~ 10–15 nm using electron-beam lithography. The DOEs developed in this work are securely protected against counterfeiting and can be replicated hundreds of millions of times using standard equipment meant for the mass production of relief holograms.

scholarly journals Three-Dimensional in Situ Electron-Beam Lithography Using Water Ice

Nano Letters ◽  
2018 ◽  
Vol 18 (8) ◽  
pp. 5036-5041 ◽  
Author(s):  
Yu Hong ◽  
Ding Zhao ◽  
Dongli Liu ◽  
Binze Ma ◽  
Guangnan Yao ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Three Dimensional ◽  
Water Ice

Fabrication of bio-inspired 3D nanoimprint mold using acceleration-voltage-modulation electron-beam lithography

2019 ◽  
Vol 8 (3-4) ◽  
pp. 289-297 ◽  
Author(s):  
Kohei Goto ◽  
Jun Taniguchi
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Three Dimensional ◽  
Modulation Method ◽  
Imprint Lithography ◽  
3D Structures ◽  
Rose Petal ◽  
Rose Petals ◽  
Acceleration Voltage ◽  
Nano Imprint

Abstract Methods for fabricating micro- and nanoscale three-dimensional (3D) structures such as electron-beam lithography (EBL) attracted attention in various fields. In EBL, an acceleration-voltage modulation method can be used to control the developing depth of the structure. In this study, we fabricated a rose petal structure using acceleration-voltage modulation. Using a rose petal mold, plastic- and silver-duplicated rose petals were prepared using nano-imprint lithography (NIL). We demonstrated that various complex 3D structures and materials can be duplicated using NIL by applying an acceleration-voltage modulation method.

Three-Dimensional Proximity Effect Correction for Multilayer Structures in Electron Beam Lithography

2004 ◽  
Vol 43 (6B) ◽  
pp. 3762-3766 ◽  
Author(s):  
Kozo Ogino ◽  
Hiromi Hoshino ◽  
Yasuhide Machida ◽  
Morimi Osawa ◽  
Hiroshi Arimoto ◽  
...  
Keyword(s):  
Electron Beam ◽  
Proximity Effect ◽  
Electron Beam Lithography ◽  
Three Dimensional ◽  
Multilayer Structures ◽  
Proximity Effect Correction

Fabrication of a three-dimensional optical vortices phase mask for astronomy by means of electron-beam lithography

2009 ◽  
Vol 86 (4-6) ◽  
pp. 1103-1106 ◽  
Author(s):  
M. Prasciolu ◽  
F. Tamburini ◽  
G. Anzolin ◽  
E. Mari ◽  
M. Melli ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Three Dimensional ◽  
Phase Mask ◽  
Optical Vortices
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