A reticle quality management strategy in wafer fabs addressing progressive mask defect growth problem at low k1 lithography

Author(s):  
Kaustuve Bhattacharyya ◽  
Mark Eickhoff ◽  
Mark Ma ◽  
Sylvia Pas
2004 ◽  
Author(s):  
Kaustuve Bhattacharyya ◽  
Kong Son ◽  
Benjamin G. Eynon, Jr. ◽  
Dadi Gudmundsson ◽  
Carmen Jaehnert ◽  
...  

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