Thin film thickness determination using reflected spectrum sampling

2005 ◽  
Author(s):  
Justin Henrie ◽  
Stephen M. Schultz ◽  
Aaron R. Hawkins
1991 ◽  
Vol 01 (03) ◽  
pp. 259-270 ◽  
Author(s):  
J. MIRANDA ◽  
A. OLIVER ◽  
F.J. RUIZ ◽  
J.M. SANTANA

The resolution of several methods for thin film thickness measurement using PIXE, based on the variation of the proton beam incident energy, is discussed. In order to evaluate the resolution, sputtering of copper films, deposited on aluminum and titanium substrates by argon ions is used. Sputtering yields are obtained through thickness changes, and then compared to other experimental and theoretical values. Good agreement is found, thus confirming the accuracy of PIXE as a method for film thickness determination.


1993 ◽  
Vol 37 ◽  
pp. 183-188
Author(s):  
T. C. Huang ◽  
R. Gilles ◽  
G. Will

AbstractPrecise thin-film thicknesses have been obtained from X-ray specular and off-specular reflectivity data collected with a conventional powder diffractometer. An analysis of the specular reflectivity curve for a 565.9-Å thick pt film showed the results agreed with those determined previously from high-resolution reflectometer data to within 6.6 Å or 1.2%. An analysis of the off-specular reflectivity curves which have well-defined interference fringes showed that the results were insensitive to the surface alignment. Values of Pt thickness for the off-specular reflectivity curves agreed with that of the specular reflectivity curve to within 6.2 Å or 1.1%. The insensitivity in film-surface misalignment makes conventional powder diffractometer attractive for film-thickness determination and opens this techniques to many laboratories.


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