Optical coatings and thin films for display technologies using closed-field magnetron sputtering

2004 ◽  
Author(s):  
Desmond R. Gibson ◽  
Ian Brinkley ◽  
J. M. Walls
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Optical Coatings ◽  
Closed Field

Deposition of multilayer optical coatings using closed-field magnetron sputtering

2006 ◽  
Author(s):  
D. R. Gibson ◽  
I. Brinkley ◽  
G. W. Hall ◽  
E. M. Waddell ◽  
J. M. Walls
Keyword(s):  
Magnetron Sputtering ◽  
Optical Coatings ◽  
Closed Field

High-rate deposition of optical coatings by closed-field magnetron sputtering

2005 ◽  
Author(s):  
D. R. Gibson ◽  
I. Brinkley ◽  
E. M. Waddell ◽  
J. M. Walls
Keyword(s):  
Magnetron Sputtering ◽  
High Rate ◽  
Optical Coatings ◽  
Closed Field

Pulsed Closed Field Unbalanced Magnetron Sputtering (P-CFUBMS) Deposited TiC/a:C Thin Films

2007 ◽  
Vol 561-565 ◽  
pp. 1177-1180 ◽  
Author(s):  
Jian Liang Lin ◽  
Brajendra Mishra ◽  
Malki Pinkas ◽  
John J. Moore
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Surface Roughness ◽  
Magnetron Sputtering ◽  
Material Selection ◽  
Closed Field ◽  
Substrate Bias ◽  
Substrate Roughness ◽  
Unbalanced Magnetron Sputtering ◽  
Unbalanced Magnetron

TiC/a:C nanocomposite thin film has proven to be a worthy material selection as a thin film for tribological applications due to its low coefficient of friction, good wear resistance and high hardness. In the current study TiC/a:C thin films with carbon concentration near 55-62 at % were deposited via pulsed closed field unbalanced magnetron sputtering (P-CFUBMS) in pure argon atmosphere with different substrate bias voltages and onto 440C stainless steel substrate with different substrate roughness. It was found that the TiC/a:C film hardness and elastic modulus were increased from 18.5 GPa to 33.8 GPa by increasing the substrate bias from floating to -150 V. However higher substrate bias can also decrease the film tibological properties. The substrate roughness has a strong effect on TiC/a:C film wear behavior. When the Ra (Mean surface roughness values) is less than 110 nm, the COF values are in low range (0.18-0.28). Further increase the Ra value to above 300 nm will result in a higher COF (>0.33). Films deposited on higher surface roughness substrate need longer time to reach the sliding equilibrium state.

Sign in / Sign up

Export Citation Format

Share Document