Pulse laser processing of metal thin films on glass substrates

2004 ◽  
Author(s):  
Gennady M. Mikheev ◽  
Ruslan G. Zonov ◽  
Dmitry G. Kaluzhny
Keyword(s):  
Thin Films ◽  
Pulse Laser ◽  
Laser Processing ◽  
Metal Thin Films ◽  
Glass Substrates

The Characteristics of Multilayer Thin Films Deposited with Metal Thin Films (Ag, Al, Cu)

2010 ◽  
Vol 97-101 ◽  
pp. 1768-1771 ◽  
Author(s):  
Dong Hun Kim ◽  
Riichi Murakami ◽  
Yun Hae Kim ◽  
Kyung Man Moon ◽  
Seung Jung An ◽  
...  
Keyword(s):  
Thin Films ◽  
Metal Particles ◽  
Zno Thin Films ◽  
Multilayer Thin Films ◽  
Electrical And Optical Properties ◽  
Metal Thin Films ◽  
Continuous Structure ◽  
Glass Substrates ◽  
The Difference ◽  
Sputtering System

In order to study the characteristics of multilayer thin films with a ZnO/ metal/ ZnO structure the manufacture of the thin films was performed by a dc (direct current) magnetron sputtering system on slide glass substrates. The ZnO thin films were manufactured with the thicknesses of 30 nm and 50 nm. Three kinds of metals (Ag, Al and Cu) were deposited with the thicknesses of 4 nm, 8 nm, 12 nm and 16 nm. The electrical and optical properties of the manufactured thin films were then observed. As a result, the multilayer thin films with an Ag layer represented the most excellent electrical conductivity. This is due to the difference in the fundamental electrical properties of each of the metals. The structures of the metal particles deposited on the ZnO thin films were observed by an SEM (scanning electron microscope). The thin films exhibited a continuous structure with regular spaces between the metal particles. This resulted in an increase of transmittance. This is considered by the decrease of scattering and of light absorption on thin films with a continuous structure.

Deposited dielectrics on metal thin films using silicon and glass substrates for hot electron-induced electrochemiluminescence

2010 ◽  
Vol 519 (1) ◽  
pp. 430-433 ◽  
Author(s):  
Antti J. Niskanen ◽  
Tiina Ylinen-Hinkka ◽  
Matti Pusa ◽  
Sakari Kulmala ◽  
Sami Franssila
Keyword(s):  
Thin Films ◽  
Hot Electron ◽  
Metal Thin Films ◽  
Glass Substrates

Thermal analysis of femtosecond laser processing for metal thin films

2010 ◽  
Vol T139 ◽  
pp. 014005 ◽  
Author(s):  
Ching-Yen Ho ◽  
Kuang-Ming Hung ◽  
Mao-Yu Wen ◽  
Je-Ee Ho
Keyword(s):  
Thin Films ◽  
Thermal Analysis ◽  
Femtosecond Laser ◽  
Laser Processing ◽  
Metal Thin Films ◽  
Femtosecond Laser Processing

Laser processing of metal thin films using transparent microsphere arrays

2015 ◽  
Vol 336 ◽  
pp. 112-117 ◽  
Author(s):  
C. Constantinescu ◽  
L.N.D. Kallepalli ◽  
P. Delaporte ◽  
O. Utéza ◽  
D. Grojo
Keyword(s):  
Thin Films ◽  
Laser Processing ◽  
Metal Thin Films

Time-temperature-transformation measurements of FePt thin films in the millisecond regime using pulse laser processing

2010 ◽  
Vol 108 (10) ◽  
pp. 103907 ◽  
Author(s):  
Yuki Inaba ◽  
Iulica Zana ◽  
Caleb Swartz ◽  
Yukiko Kubota ◽  
Tim Klemmer ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulse Laser ◽  
Laser Processing ◽  
Temperature Transformation ◽  
Fept Thin Films

Adhesion Effects on the Recrystallization of Silicon Films

1984 ◽  
Vol 35 ◽  
Author(s):  
C. E. Bleil ◽  
J. R. Troxell
Keyword(s):  
Thin Films ◽  
Silicon Dioxide ◽  
Laser Processing ◽  
High Surface ◽  
Silicon Film ◽  
Device Fabrication ◽  
Silicon On Insulator ◽  
Molten Silicon ◽  
Glass Substrates ◽  
Thickness Variations

ABSTRACTLaser processing of thin films of amorphous or polycrystalline silicon on insulator substrates, such as the glass normally used for liquid crystal displays, frequently leads to film thickness variations which are unacceptable for device fabrication. Some thickness variations are caused by the high surface tension of molten silicon and the poor adhesion of the silicon to the substrate. Techniques to reduce this problem by increasing the adhesion of the film to silicon dioxide coated Corning 7059 glass substrates have been investigated. Two different approaches were used. First, silicon ions were implanted into the silicon-glass interface to increase the direct bonding of the silicon to the silicon dioxide. Second, layers of material known to exhibit better adhesion to both silicon and silicon dioxide were introduced between the silicon film and the glass substrate. Both techniques produced films which, after subsequent laser processing, showed significantly reduced thickness variations. These procedures make it possible to laser process thin films of silicon on Corning 7059 glass substrates under conditions which produce large grain polysilicon films without producing unacceptably large thickness variations or film cracking.

Transmission Electron Microscopy studies of the vacancy ordering in YSI2-X thin films

1991 ◽  
Vol 49 ◽  
pp. 562-563
Author(s):  
F.-R. Chen ◽  
T. L. Lee ◽  
L. J. Chen
Keyword(s):  
Crystal Structure ◽  
Electron Microscopy ◽  
Thin Films ◽  
Diffraction Pattern ◽  
Annealing Temperature ◽  
Lattice Mismatch ◽  
Si Substrate ◽  
Metal Thin Films ◽  
Transmission Electron ◽  
Vacancy Ordering

YSi2-x thin films were grown by depositing the yttrium metal thin films on (111)Si substrate followed by a rapid thermal annealing (RTA) at 450 to 1100°C. The x value of the YSi2-x films ranges from 0 to 0.3. The (0001) plane of the YSi2-x films have an ideal zero lattice mismatch relative to (111)Si surface lattice. The YSi2 has the hexagonal AlB2 crystal structure. The orientation relationship with Si was determined from the diffraction pattern shown in figure 1(a) to be and . The diffraction pattern in figure 1(a) was taken from a specimen annealed at 500°C for 15 second. As the annealing temperature was increased to 600°C, superlattice diffraction spots appear at position as seen in figure 1(b) which may be due to vacancy ordering in the YSi2-x films. The ordered vacancies in YSi2-x form a mesh in Si plane suggested by a LEED experiment.

Laser-Direct Patterning of Nanostructured Metal Thin Films

2010 ◽  
Vol 48 (2) ◽  
pp. 163-168 ◽  
Author(s):  
Hyunkwon Shin ◽  
Hyeongjae Lee ◽  
Hyeongjae Yoo ◽  
Ki-Soo Lim ◽  
Myeongkyu Lee
Keyword(s):  
Thin Films ◽  
Metal Thin Films ◽  
Direct Patterning ◽  
Nanostructured Metal
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