Electron-optical system of a small-scale electron beam ion source

2004 ◽  
Author(s):  
V. G. Abdul'manov ◽  
P. D. Voblyi ◽  
P. V. Nevskii
Keyword(s):  
Electron Beam ◽  
Optical System ◽  
Ion Source ◽  
Small Scale ◽  
Electron Optical System

Simulation of the electron-optical system of the MIS-I electron-beam multicharged ion

2003 ◽  
Author(s):  
V. G. Abdul'manov ◽  
P. D. Voblyi ◽  
A. V. Utkin ◽  
V. P. Tomilov ◽  
Yu. N. Yudin ◽  
...  
Keyword(s):  
Electron Beam ◽  
Optical System ◽  
Electron Optical System

Simulation of electron beam formation and transport in a gas-filled electron-optical system with a plasma emitter

2016 ◽  
Vol 42 (7) ◽  
pp. 713-717 ◽  
Author(s):  
A. A. Grishkov ◽  
S. Yu. Kornilov ◽  
N. G. Rempe ◽  
S. V. Shidlovskiy ◽  
V. A. Shklyaev
Keyword(s):  
Electron Beam ◽  
Optical System ◽  
Electron Optical System ◽  
Plasma Emitter ◽  
Beam Formation

scholarly journals NUMERICAL SIMULATION OF MULTIBEAM SYSTEMS BY EL&ION CODE

2020 ◽  
pp. 92-93
Author(s):  
P.A. Martynenko
Keyword(s):  
Numerical Simulation ◽  
Electron Beam ◽  
Numerical Analysis ◽  
Optical System ◽  
Ion Beam ◽  
High Density ◽  
Second Law ◽  
Electron Optical System ◽  
Reactive Gases ◽  
A Current

Based on the tube method, taking into account the three second law for the current in each tube, the program EL&ION for preliminary rapid numerical analysis of the electron-optical system was developed, using which the system was developed for generating an ion beam of reactive gases with an energy of up to 50 keV and a current of 10...20 mA in the presence of high-density electron beam.

Electron optical system with integrated PCM for sheet electron beam devices

2021 ◽  
Vol 28 (12) ◽  
pp. 123101
Author(s):  
PengCheng Yin ◽  
Jin Xu ◽  
ShuanZhu Fang ◽  
RuiChao Yang ◽  
JinJing Luo ◽  
...  
Keyword(s):  
Electron Beam ◽  
Optical System ◽  
Electron Optical System ◽  
Sheet Electron Beam

Nucleation and Early Growth of Sputtered thin Films

1970 ◽  
Vol 28 ◽  
pp. 516-517
Author(s):  
Dudley M. Sherman ◽  
Thos. E. Hutchinson
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
Ion Beam ◽  
Ion Source ◽  
Water Cooling ◽  
Stages Of Growth ◽  
Lens Assembly ◽  
Microscope Technique ◽  
Ion Beam Sputter Deposition

The in situ electron microscope technique has been shown to be a powerful method for investigating the nucleation and growth of thin films formed by vacuum vapor deposition. The nucleation and early stages of growth of metal deposits formed by ion beam sputter-deposition are now being studied by the in situ technique.A duoplasmatron ion source and lens assembly has been attached to one side of the universal chamber of an RCA EMU-4 microscope and a sputtering target inserted into the chamber from the opposite side. The material to be deposited, in disc form, is bonded to the end of an electrically isolated copper rod that has provisions for target water cooling. The ion beam is normal to the microscope electron beam and the target is placed adjacent to the electron beam above the specimen hot stage, as shown in Figure 1.

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