Influence of parameters of the plasma electron sources on the characteristics of narrow electron beam

2004 ◽  
Author(s):  
O. N. Petrovich
Keyword(s):  
Electron Beam ◽  
Plasma Electron ◽  
Electron Sources

scholarly journals Electron-Beam Synthesis of Dielectric Coatings Using Forevacuum Plasma Electron Sources (Review)

Coatings ◽  
2022 ◽  
Vol 12 (1) ◽  
pp. 82
Author(s):  
Yury G. Yushkov ◽  
Efim M. Oks ◽  
Andrey V. Tyunkov ◽  
Denis B. Zolotukhin
Keyword(s):  
Electron Beam ◽  
Direct Action ◽  
Elevated Pressure ◽  
Plasma Electron ◽  
Electron Beam Evaporation ◽  
Electron Sources ◽  
Dielectric Coatings ◽  
Ion Plasma ◽  
Methods Of Synthesis ◽  
Electron Beam Heating

This is a review of current developments in the field of ion-plasma and beam methods of synthesis of protective and functional dielectric coatings. We give rationales for attractiveness and prospects of creating such coatings by electron-beam heating and following evaporation of dielectric targets. Forevacuum plasma electron sources, operating at elevated pressure values from units to hundreds of pascals, make it possible to exert the direct action of an electron beam on low-conductive materials. Electron-beam evaporation of aluminum oxide, boron, and silicon carbide targets is used to exemplify the particular features of electron-beam synthesis of such coatings and their parameters and characteristics.

scholarly journals Application of Novel Non-Thermal Physical Technologies to Degrade Mycotoxins

2021 ◽  
Vol 7 (5) ◽  
pp. 395
Author(s):  
Mohammad Yousefi ◽  
Masoud Aman Mohammadi ◽  
Maryam Zabihzadeh Khajavi ◽  
Ali Ehsani ◽  
Vladimír Scholtz
Keyword(s):  
Electron Beam ◽  
Food Systems ◽  
Large Scale ◽  
Plasma Electron ◽  
Pulsed Light ◽  
Beam Radiation ◽  
Practical Applications ◽  
Electron Beam Radiation ◽  
Non Thermal Plasma ◽  
Agriculture And Food

Mycotoxins cause adverse effects on human health. Therefore, it is of the utmost importance to confront them, particularly in agriculture and food systems. Non-thermal plasma, electron beam radiation, and pulsed light are possible novel non-thermal technologies offering promising results in degrading mycotoxins with potential for practical applications. In this paper, the available publications are reviewed—some of them report efficiency of more than 90%, sometimes almost 100%. The mechanisms of action, advantages, efficacy, limitations, and undesirable effects are reviewed and discussed. The first foretastes of plasma and electron beam application in the industry are in the developing stages, while pulsed light has not been employed in large-scale application yet.

Ribbon electron beam formation by a forevacuum plasma electron source

2016 ◽  
Vol 42 (1) ◽  
pp. 96-99 ◽  
Author(s):  
A. S. Klimov ◽  
V. A. Burdovitsin ◽  
A. A. Grishkov ◽  
E. M. Oks ◽  
A. A. Zenin ◽  
...  
Keyword(s):  
Electron Beam ◽  
Plasma Electron ◽  
Electron Source ◽  
Plasma Electron Source ◽  
Beam Formation

Pulsed plasma electron sources

2009 ◽  
Vol 16 (5) ◽  
pp. 057103 ◽  
Author(s):  
Ya. E. Krasik ◽  
D. Yarmolich ◽  
J. Z. Gleizer ◽  
V. Vekselman ◽  
Y. Hadas ◽  
...  
Keyword(s):  
Plasma Electron ◽  
Pulsed Plasma ◽  
Electron Sources

scholarly journals Electro-optic spatial decoding on the spherical-wavefront Coulomb fields of plasma electron sources

2018 ◽  
Vol 8 (1) ◽  
Author(s):  
K. Huang ◽  
T. Esirkepov ◽  
J. K. Koga ◽  
H. Kotaki ◽  
M. Mori ◽  
...  
Keyword(s):  
Plasma Electron ◽  
Electron Sources ◽  
Electro Optic ◽  
Spherical Wavefront

Electrical properties of aluminum oxide ceramics film on a metal

2021 ◽  
Vol 2 ◽  
pp. 59-65
Author(s):  
I. Yu. Bakeev ◽  
◽  
Yu. A. Burachevsky ◽  
E. S. Dvilis ◽  
D. B. Zolotukhin ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electrical Properties ◽  
Aluminum Oxide ◽  
Relative Dielectric Constant ◽  
Plasma Electron ◽  
Electron Beam Evaporation ◽  
Original Method ◽  
Alumina Powder ◽  
Oxide Ceramic ◽  
Temperature Dependences

The work is devoted to the study of electrical properties (temperature dependences of conductivity, relative dielectric constant, dielectric loss tangent for various frequencies) of an aluminum oxide ceramic film deposited on a metal substrate. The film was created by the original method of electron beam evaporation of a non-conductive target, consisting of a compressed alumina powder, using a plasma electron source, which is able to reliably operate in the fore-vacuum pressure range (5 – 100 Pa). Such increased working gas pressures ensures the generation of a dense beam plasma near the target, which neutralizes the charging of a non-conducting target and thereby provides its effective melting and electron beam evaporation.

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