Pulsed plasma electron sources

2009 ◽  
Vol 16 (5) ◽  
pp. 057103 ◽  
Author(s):  
Ya. E. Krasik ◽  
D. Yarmolich ◽  
J. Z. Gleizer ◽  
V. Vekselman ◽  
Y. Hadas ◽  
...  
Keyword(s):  
Plasma Electron ◽  
Pulsed Plasma ◽  
Electron Sources

scholarly journals Electro-optic spatial decoding on the spherical-wavefront Coulomb fields of plasma electron sources

2018 ◽  
Vol 8 (1) ◽  
Author(s):  
K. Huang ◽  
T. Esirkepov ◽  
J. K. Koga ◽  
H. Kotaki ◽  
M. Mori ◽  
...  
Keyword(s):  
Plasma Electron ◽  
Electron Sources ◽  
Electro Optic ◽  
Spherical Wavefront

scholarly journals Electron-Beam Synthesis of Dielectric Coatings Using Forevacuum Plasma Electron Sources (Review)

Coatings ◽  
2022 ◽  
Vol 12 (1) ◽  
pp. 82
Author(s):  
Yury G. Yushkov ◽  
Efim M. Oks ◽  
Andrey V. Tyunkov ◽  
Denis B. Zolotukhin
Keyword(s):  
Electron Beam ◽  
Direct Action ◽  
Elevated Pressure ◽  
Plasma Electron ◽  
Electron Beam Evaporation ◽  
Electron Sources ◽  
Dielectric Coatings ◽  
Ion Plasma ◽  
Methods Of Synthesis ◽  
Electron Beam Heating

This is a review of current developments in the field of ion-plasma and beam methods of synthesis of protective and functional dielectric coatings. We give rationales for attractiveness and prospects of creating such coatings by electron-beam heating and following evaporation of dielectric targets. Forevacuum plasma electron sources, operating at elevated pressure values from units to hundreds of pascals, make it possible to exert the direct action of an electron beam on low-conductive materials. Electron-beam evaporation of aluminum oxide, boron, and silicon carbide targets is used to exemplify the particular features of electron-beam synthesis of such coatings and their parameters and characteristics.

scholarly journals Ignition of A Plasma Discharge Inside An Electrodeless Chamber: Methods and Characteristics

Plasma ◽  
2019 ◽  
Vol 2 (4) ◽  
pp. 380-386 ◽  
Author(s):  
Laroussi
Keyword(s):  
Electron Number Density ◽  
Plasma Electron ◽  
Pulsed Plasma ◽  
Number Density ◽  
Reduced Pressure ◽  
Charge Coupled Device ◽  
Pressure Discharge ◽  
Expansion Speed ◽  
Discharge Parameters ◽  
Intensified Charge Coupled Device

In this paper the generation and diagnostics of a reduced pressure (300 mTorr to 3 Torr) plasma generated inside an electrodeless containment vessel/chamber are presented. The plasma is ignited by a guided ionization wave emitted by a low temperature pulsed plasma jet. The diagnostics techniques include Intensified Charge Coupled Device (ICCD) imaging, emission spectroscopy, and Langmuir probe. The reduced-pressure discharge parameters measured are the magnitude of the electric field, the plasma electron number density and temperature, and discharge expansion speed.

scholarly journals Experience in the development and application of fore-vacuum plasma electron sources

2016 ◽  
Vol 19 (2) ◽  
pp. 5-10
Author(s):  
V.A. Burdovitsin ◽  
◽  
I.Yu. Bakeev ◽  
D.B. Zolotukhin ◽  
A.A Zenin ◽  
...  
Keyword(s):  
Plasma Electron ◽  
Electron Sources ◽  
Vacuum Plasma
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