Lithium fluoride coloration by laser-plasma soft x-rays: a promising tool for x-ray microscopy and photonics

2004 ◽  
Author(s):  
Francesco Flora ◽  
Giuseppe Baldacchini ◽  
Francesca Bonfigli ◽  
Antonella Lai ◽  
Tiziana Marolo ◽  
...  
Keyword(s):  
Laser Plasma ◽  
Lithium Fluoride ◽  
X Rays ◽  
X Ray ◽  
Promising Tool

X-ray microscopy of biological specimens with laser plasma x rays

1994 ◽  
Author(s):  
Kunio Shinohara ◽  
Atsushi Ito ◽  
Yasuhito Kinjo
Keyword(s):  
Laser Plasma ◽  
X Rays ◽  
X Ray ◽  
Title X

Point Defects in Lithium Fluoride by EUV and Soft X-Rays Exposure for X-Ray Microscopy and Optical Applications

2004 ◽  
Vol 10 (6) ◽  
pp. 1435-1445 ◽  
Author(s):  
G. Baldacchini ◽  
S. Bollanti ◽  
F. Bonfigli ◽  
P. DiLazzaro ◽  
A.Ya. Faenov ◽  
...  
Keyword(s):  
Point Defects ◽  
Lithium Fluoride ◽  
X Rays ◽  
X Ray ◽  
Optical Applications

Versatile Lithium Fluoride Luminescent Detectors for High Resolution Imaging Applications from Extreme Ultraviolet to Soft and Hard X-Rays

2016 ◽  
Vol 98 ◽  
pp. 54-63
Author(s):  
Francesca Bonfigli ◽  
Enrico Nichelatti ◽  
Maria Aurora Vincenti ◽  
Rosa Maria Montereali
Keyword(s):  
Spatial Resolution ◽  
Lithium Fluoride ◽  
Dynamic Range ◽  
High Spatial Resolution ◽  
Extreme Ultraviolet ◽  
Large Field ◽  
X Rays ◽  
X Ray ◽  
Research Fields ◽  
X Ray Imaging

X-ray imaging represents a very relevant tool in basic and applied research fields due to the possibility of performing non-destructive investigations with high spatial resolution. We present innovative X-ray imaging detectors based on visible photoluminescence from aggregate electronic defects locally created in lithium fluoride (LiF) during irradiation. Among the peculiarities of these detectors, noteworthy ones are their very high spatial resolution (intrinsic ∼2 nm, standard ∼300 nm) across a large field of view (>10 cm2), wide dynamic range (>103) and their insensitivity to ambient light. The material photoluminescence response can be enhanced through the proper choice of reflecting substrates and multi-layer designs in the case of LiF films. The present investigation deals with the most appealing X-ray imaging applications, from simple lensless imaging configurations with commonly-available laboratory polychromatic X-ray sources to X-ray imaging-dedicated synchrotron beamlines in absorption and phase contrast experiments.

Time-resolved soft x-ray absorption spectroscopy of silicon using femtosecond laser plasma x rays

1999 ◽  
Vol 75 (16) ◽  
pp. 2350-2352 ◽  
Author(s):  
Hidetoshi Nakano ◽  
Yoshinori Goto ◽  
Peixiang Lu ◽  
Tadashi Nishikawa ◽  
Naoshi Uesugi
Keyword(s):  
Femtosecond Laser ◽  
Absorption Spectroscopy ◽  
Laser Plasma ◽  
X Rays ◽  
Time Resolved ◽  
X Ray ◽  
Femtosecond Laser Plasma ◽  
X Ray Absorption

Asymmetric Crystals Re-Visited

1987 ◽  
Vol 31 ◽  
pp. 395-401
Author(s):  
Michael A. Short ◽  
Stephen E. Robie
Keyword(s):  
Single Crystal ◽  
Single Crystals ◽  
Lithium Fluoride ◽  
X Rays ◽  
X Ray ◽  
Intense Beam

An asymmetrically cut single crystal is, generally, a large flat X-ray monochromating crystal whose principal surface has been cut an angle to the diffracting planes being utilised.The use of such a crystal was suggested by Stephen and Barnes in 1935 as a means of obtaining a narrow intense beam of monochromatic X-rays. Fankuchen was first to demonstrate this effect experimentally. A number of symmetrically cut mosaic single crystals, including lithium fluoride, was studied by Evans, Hirsch and Kellar and by Gay, Hirsch and Kellar in the beam condensing (beam narrowing) mode only.

scholarly journals X-Ray Lithography Studies of Polysilane using a Laser Plasma X-Ray Source

1988 ◽  
Vol 129 ◽  
Author(s):  
Glenn D. Kubiak ◽  
Duane A. Outka ◽  
John M. Zeigler
Keyword(s):  
Absorption Spectra ◽  
Photon Energy ◽  
Laser Plasma ◽  
Plasma Source ◽  
Wire Mesh ◽  
X Rays ◽  
X Ray ◽  
X Ray Absorption

ABSTRACTA laser-generated plasma source of monochromatized soft x-rays has been used to study the x-ray lithographic resist properties of poly(cyclohexylmethylsilane-co-dimethylsilane). X-ray absorption spectra near the SiL2,3 edge of unexposed samples were measured to guide the choice of exposure photon energy. We find that poly(cyclohexyl-methylsilane-co-dimethylsilane) exhibits positive tone at x-ray energies near 105 eV (Si 2p resonance), a sensitivity of 1000 mJ/cm2 and a contrast of 1.5. Sensitivity is found to increase markedly when exposed samples are held in air before development. Using simple wire mesh masks, estimates of the minimum achievable linewidth have been made.

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