Negative resist image by dry etching as a novel top surface imaging process for ion-beam lithography
1998 ◽
Vol 16
(4)
◽
pp. 1987
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2006 ◽
Vol 77
(3)
◽
pp. 03C111
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2021 ◽
Vol 31
(5)
◽
pp. 1-4
1998 ◽
Vol 16
(4)
◽
pp. 2484
◽
2012 ◽
Vol 272
◽
pp. 149-152
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1999 ◽
Vol 46
(1-4)
◽
pp. 469-472
◽
1994 ◽
Vol 12
(6)
◽
pp. 3925
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