Large-field ion optics for projection and proximity printing and for maskless lithography (ML2)

2002 ◽  
Author(s):  
Hans Loeschner ◽  
Gerhard Stengl ◽  
Herbert Buschbeck ◽  
A. Chalupka ◽  
Gertraud Lammer ◽  
...  
Keyword(s):  
Large Field ◽  
Maskless Lithography ◽  
Ion Optics

Ion Projection Direct-Structuring For Nanotechnology Applications

2002 ◽  
Vol 739 ◽  
Author(s):  
Hans Loeschner ◽  
Ernest J. Fantner ◽  
Regina Korntner ◽  
Elmar Platzgummer ◽  
Gerhard Stengl ◽  
...  
Keyword(s):  
Large Field ◽  
Tool Development ◽  
Magnetic Media ◽  
Single Exposure ◽  
Ion Optics ◽  
First Results

ABSTRACTLarge-field ion-optics has been developed for reduction printing. Sub-100nm ion projection direct-structuring (IPDS) of patterned magnetic media discs has been demonstrated, extending over 17mm diameter exposure fields, in a single exposure. First results of IPDS patterning of nanocomposite resist material are presented. Information about a novel 200x reduction projection focused ion multi-beam (PROFIB) tool development is provided. Further IPDS nanotechnology applications are discussed.

Trial production of γ-type energy filtering TEM

1995 ◽  
Vol 53 ◽  
pp. 604-605
Author(s):  
Y. Taniguchi ◽  
E. Nakazawa ◽  
S. Taya
Keyword(s):  
Magnetic Energy ◽  
Electron Optics ◽  
Electron Microscopic ◽  
Mass Spectrometers ◽  
Ion Optics ◽  
Energy Filtering ◽  
New Information ◽  
New Type ◽  
Fringing Fields

Imaging energy filters can add new information to electron microscopic images with respect to energy-axis, so-called electron spectroscopic imaging (ESI). Recently, many good results have been reported using this imaging technique. ESI also allows high-contrast observation of unstained biological samples, becoming a trend of the field of morphology. We manufactured a new type of energy filter as a trial production. This energy filter consists of two magnets, and we call γ-filter since the trajectory of electrons shows ‘γ’-shape inside the filter. We evaluated the new energyγ-filter TEM with the γ-filter.Figure 1 shows schematic view of the electron optics of the γ-type energy filter. For the determination of the electron-optics of the γ-type energy filter, we used the TRIO (Third Order Ion Optics) program which has been developed for the design of high resolution mass spectrometers. The TRIO takes the extended fringing fields (EFF) into consideration. EFF makes it difficult to design magnetic energy filters with magnetic sector fields.

Ion optics in a 14 UD Pelletron terminal

1977 ◽  
Vol 12 (10) ◽  
pp. 1563-1566
Author(s):  
Z. Segalov ◽  
E. Skurnik
Keyword(s):  
Ion Optics

Failure Analysis and Defect Inspection of Electronic Devices by High-Resolution Cathodoluminescence

2017 ◽  
Author(s):  
C. Monachon ◽  
M.S. Zielinski ◽  
D. Gachet ◽  
S. Sonderegger ◽  
S. Muckenhirn ◽  
...  
Keyword(s):  
Failure Analysis ◽  
Electronic Materials ◽  
Electronic Devices ◽  
Optical Emission ◽  
Large Field ◽  
Nanometer Scale ◽  
Defect Analysis ◽  
Defect Inspection ◽  
Spectrally Resolved ◽  
Non Destructive

Abstract Quantitative cathodoluminescence (CL) microscopy is a new optical spectroscopy technique that measures electron beam-induced optical emission over large field of view with a spatial resolution close to that of a scanning electron microscope (SEM). Correlation of surface morphology (SE contrast) with spectrally resolved and highly material composition sensitive CL emission opens a new pathway in non-destructive failure and defect analysis at the nanometer scale. Here we present application of a modern CL microscope in defect and homogeneity metrology, as well as failure analysis in semiconducting electronic materials

Numerical analysis of shift error in X-ray phase contrast imaging for large field of view

2017 ◽  
Vol 34 (1) ◽  
pp. 8
Author(s):  
Jianheng Huang ◽  
Yaohu Lei ◽  
Xin Liu ◽  
Jinchuan Guo ◽  
Ji Li ◽  
...  
Keyword(s):  
Numerical Analysis ◽  
Phase Contrast ◽  
Field Of View ◽  
Phase Contrast Imaging ◽  
Large Field ◽  
Contrast Imaging ◽  
X Ray
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