One-step lithography for fabrication of a hybrid microlens array using a coding gray-level mask

Femtosecond laser one-step direct-writing cylindrical microlens array on fused silica

Optics Letters ◽

10.1364/ol.42.002358 ◽

2017 ◽

Vol 42 (12) ◽

pp. 2358 ◽

Cited By ~ 14

Author(s):

Zhi Luo ◽

Ji’an Duan ◽

Chunlei Guo

Keyword(s):

Femtosecond Laser ◽

Microlens Array ◽

Fused Silica ◽

Direct Writing ◽

One Step

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One-step fabrication of achromatic spherical microlens array on enzyme etched gelatin film

Microelectronic Engineering ◽

10.1016/j.mee.2008.11.049 ◽

2009 ◽

Vol 86 (4-6) ◽

pp. 1096-1098

Author(s):

Jianhua Zhu ◽

Chongwei Jin ◽

Xiaoya Duan ◽

Yongkang Guo ◽

Jun Yao

Keyword(s):

Microlens Array ◽

Gelatin Film ◽

One Step

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One-step lithography for mass production of multilevel diffractive optical elements using high-energy beam sensitive (HEBS) gray-level mask

10.1117/12.239618 ◽

1996 ◽

Cited By ~ 13

Author(s):

Walter Daschner ◽

Robert D. Stein ◽

Pin Long ◽

Chuck Wu ◽

Sing H. Lee

Keyword(s):

Mass Production ◽

High Energy ◽

Gray Level ◽

Diffractive Optical Elements ◽

Optical Elements ◽

Energy Beam ◽

One Step ◽

Title One ◽

High Energy Beam

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Fabrication of Multifocal Microlens Array by One Step Exposure Process

Micromachines ◽

10.3390/mi12091097 ◽

2021 ◽

Vol 12 (9) ◽

pp. 1097

Author(s):

Wei Yuan ◽

Yajuan Cai ◽

Cheng Xu ◽

Hui Pang ◽

Axiu Cao ◽

...

Keyword(s):

Microlens Array ◽

Exposure Dose ◽

Optical Systems ◽

Nonlinear Relationship ◽

Fabrication Method ◽

Practical Applications ◽

Continuous Surface ◽

One Step ◽

Field Imaging ◽

Exposure Process

Microlenses can be widely used in integrated micro-optical systems. However, in some special applications, such as light field imaging systems, multifocal microlens arrays (MLA) are expected to improve imaging resolution. For the fabrication of multifocal MLA, the traditional fabrication method is no longer applicable. To solve this problem, a fabrication method of multifocal MLA by a one step exposure process is proposed. Through the analyses and research of photoresist AZ9260, the nonlinear relationship between exposure dose and exposure depth is established. In the design of the mask, the mask pattern is corrected according to the nonlinear relationship to obtain the final mask. The continuous surface of the multifocal MLA is fabricated by the mask moving exposure. The experimental results show that the prepared multifocal MLA has high filling factor and surface fidelity. What is more, this method is simple and efficient to use in practical applications.

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Laser direct-write gray-level mask and one-step etching for diffractive microlens fabrication

Applied Optics ◽

10.1364/ao.37.007568 ◽

1998 ◽

Vol 37 (32) ◽

pp. 7568 ◽

Cited By ~ 40

Author(s):

Michael R. Wang ◽

Heng Su

Keyword(s):

Direct Write ◽

Gray Level ◽

One Step ◽

Laser Direct Write ◽

Diffractive Microlens

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An Interactive Minicomputer Program for the Indexing and Simulation of Electron Diffraction Patterns

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100092670 ◽

1976 ◽

Vol 34 ◽

pp. 542-543

Author(s):

R.P. Goehner ◽

W.T. Hatfield ◽

Prakash Rao

Keyword(s):

Electron Diffraction ◽

Real Time ◽

Pattern Analysis ◽

Flow Diagram ◽

Hard Copy ◽

Time Analysis ◽

Real Time Analysis ◽

Transmission Electron ◽

One Step ◽

Diffraction Patterns

Computer programs are now available in various laboratories for the indexing and simulation of transmission electron diffraction patterns. Although these programs address themselves to the solution of various aspects of the indexing and simulation process, the ultimate goal is to perform real time diffraction pattern analysis directly off of the imaging screen of the transmission electron microscope. The program to be described in this paper represents one step prior to real time analysis. It involves the combination of two programs, described in an earlier paper(l), into a single program for use on an interactive basis with a minicomputer. In our case, the minicomputer is an INTERDATA 70 equipped with a Tektronix 4010-1 graphical display terminal and hard copy unit.A simplified flow diagram of the combined program, written in Fortran IV, is shown in Figure 1. It consists of two programs INDEX and TEDP which index and simulate electron diffraction patterns respectively. The user has the option of choosing either the indexing or simulating aspects of the combined program.

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Nutrient-regulated gene expression in eukaryotes

Biochemical Society Symposium ◽

10.1042/bss0730085 ◽

2006 ◽

Vol 73 ◽

pp. 85-96 ◽

Cited By ~ 8

Author(s):

Richard J. Reece ◽

Laila Beynon ◽

Stacey Holden ◽

Amanda D. Hughes ◽

Karine Rébora ◽

...

Keyword(s):

Gene Expression ◽

Rna Polymerase ◽

Rna Polymerase Ii ◽

Transcriptional Control ◽

Direct Interaction ◽

Signalling Pathways ◽

A Cell ◽

One Step ◽

Higher Eukaryotes ◽

Regulated Gene Expression

The recognition of changes in environmental conditions, and the ability to adapt to these changes, is essential for the viability of cells. There are numerous well characterized systems by which the presence or absence of an individual metabolite may be recognized by a cell. However, the recognition of a metabolite is just one step in a process that often results in changes in the expression of whole sets of genes required to respond to that metabolite. In higher eukaryotes, the signalling pathway between metabolite recognition and transcriptional control can be complex. Recent evidence from the relatively simple eukaryote yeast suggests that complex signalling pathways may be circumvented through the direct interaction between individual metabolites and regulators of RNA polymerase II-mediated transcription. Biochemical and structural analyses are beginning to unravel these elegant genetic control elements.

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