One-step lithography for mass production of multilevel diffractive optical elements using high-energy beam sensitive (HEBS) gray-level mask
Keyword(s):
One Step
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Keyword(s):
1996 ◽
Vol 14
(6)
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pp. 3730
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Keyword(s):
2012 ◽
Vol 7
(04)
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pp. P04002-P04002
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1955 ◽
Vol 26
(2)
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pp. 229-231
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2001 ◽
Vol 34
(23)
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pp. L125-L128
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2007 ◽
Vol 264
(2)
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pp. 259-266
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