One-step lithography for mass production of multilevel diffractive optical elements using high-energy beam sensitive (HEBS) gray-level mask

Author(s):  
Walter Daschner ◽  
Robert D. Stein ◽  
Pin Long ◽  
Chuck Wu ◽  
Sing H. Lee
2021 ◽  
Vol 11 (1) ◽  
Author(s):  
Alexander Goncharsky ◽  
Anton Goncharsky ◽  
Dmitry Melnik ◽  
Svyatoslav Durlevich

AbstractThis paper focuses on the development of flat diffractive optical elements (DOEs) for protecting banknotes, documents, plastic cards, and securities against counterfeiting. A DOE is a flat diffractive element whose microrelief, when illuminated by white light, forms a visual image consisting of several symbols (digits or letters), which move across the optical element when tilted. The images formed by these elements are asymmetric with respect to the zero order. To form these images, the microrelief of a DOE must itself be asymmetric. The microrelief has a depth of ~ 0.3 microns and is shaped with an accuracy of ~ 10–15 nm using electron-beam lithography. The DOEs developed in this work are securely protected against counterfeiting and can be replicated hundreds of millions of times using standard equipment meant for the mass production of relief holograms.


2012 ◽  
Vol 7 (04) ◽  
pp. P04002-P04002 ◽  
Author(s):  
E Bagli ◽  
L Bandiera ◽  
P Dalpiaz ◽  
V Guidi ◽  
A Mazzolari ◽  
...  

1955 ◽  
Vol 26 (2) ◽  
pp. 229-231 ◽  
Author(s):  
G. W. Tautfest ◽  
H. R. Fechter

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