Raster Shaped Beam Pattern Generation for 70 nm Photomask Production

2002 ◽  
Author(s):  
Thomas H. Newman ◽  
Ira Finklestein ◽  
Huei-Mei Kao ◽  
Sriram Krishnaswami ◽  
Darryn Long ◽  
...  
Keyword(s):  
Pattern Generation ◽  
Beam Pattern ◽  
Shaped Beam

Raster shaped beam pattern generation

1999 ◽  
Vol 17 (6) ◽  
pp. 2927 ◽  
Author(s):  
S. A. Rishton ◽  
J. K. Varner ◽  
L. H. Veneklasen ◽  
V. Boegli ◽  
A. L. Sagle ◽  
...  
Keyword(s):  
Pattern Generation ◽  
Beam Pattern ◽  
Shaped Beam

Low-Sidelobe Shaped-Beam Pattern Synthesis With Amplitude Constraints

2021 ◽  
pp. 1-1
Author(s):  
Zhipeng Lin ◽  
Haoquan Hu ◽  
Shiwen Lei ◽  
Ruiming Li ◽  
Jing Tian ◽  
...  
Keyword(s):  
Beam Pattern ◽  
Pattern Synthesis ◽  
Shaped Beam ◽  
Low Sidelobe

Shaped-Beam Pattern Synthesis Through the Construction of Weighted Generalized Rayleigh Quotient

2019 ◽  
Vol 28 (1) ◽  
pp. 207-214
Author(s):  
Yin Yang ◽  
Chuan Wan ◽  
Weixing Sheng ◽  
Yubing Han ◽  
Xiaofeng Ma
Keyword(s):  
Rayleigh Quotient ◽  
Beam Pattern ◽  
Pattern Synthesis ◽  
Shaped Beam ◽  
Generalized Rayleigh Quotient

Wide band low profile linear microstrip antenna array with cosecant square-shaped beam pattern

2007 ◽  
Vol 49 (4) ◽  
pp. 963-965 ◽  
Author(s):  
Ashutosh Kedar ◽  
Prem N. S. Kutiyal ◽  
M. Garg ◽  
U. K. Revankar
Keyword(s):  
Antenna Array ◽  
Microstrip Antenna ◽  
Wide Band ◽  
Beam Pattern ◽  
Shaped Beam ◽  
Low Profile ◽  
Microstrip Antenna Array

Beam shaping techniques in scanning electron lithography systems

1978 ◽  
Vol 36 (1) ◽  
pp. 162-163
Author(s):  
H. C. Pfeiffer
Keyword(s):  
Spatial Resolution ◽  
Beam Shaping ◽  
Pattern Generation ◽  
Image Point ◽  
Beam Spot ◽  
Shaped Beam ◽  
Projection Techniques ◽  
Computer Controlled ◽  
Electron Lithography ◽  
Scanning Electron

A variety of beam shaping techniques are described which we have developed to overcome writing speed limitations inherent to the serial exposure of scanning electron beam lithography systems. We will present experimental results demonstrating the technical feasibility of the various shaping techniques. Figure 1 illustrates E-beam pattern generation by a Gaussian round beam and various shaped beam configurations. The SEM-type, Gaussian round beam exposes one image point at a time. The size of the beam spot is identical with the spatial resolution of the system and is typically 4 to 5 times smaller than the minimum pattern features. For shaped-beam systems, the spatial resolution given by the edge slope of the beam profile is decoupled from the size and shape of the beam spot. Consequently, a plurality of image points can be projected in parallel without loss of resolution. This combination of scanning and projection techniques provides a fast exposure rate without sacrificing the flexibility of computer-controlled pattern generation.

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