High-aspect-ratio structure formation in x-ray lithography

2000 ◽  
Author(s):  
Vladimir A. Kudryashov ◽  
Sing Lee
Keyword(s):  
Aspect Ratio ◽  
Structure Formation ◽  
High Aspect Ratio ◽  
X Ray ◽  
High Aspect Ratio Structure

scholarly journals The orientation of the layered aluminosilicates particles with a high aspect ratio in paraffin under electric field

2019 ◽  
Vol 486 (6) ◽  
pp. 663-667
Author(s):  
N. M. Kuznetsov ◽  
A. V. Bakirov ◽  
S. I. Belousov ◽  
S. N. Chvalun
Keyword(s):  
Aspect Ratio ◽  
Electric Field ◽  
Structure Formation ◽  
High Aspect Ratio ◽  
Structural Organization ◽  
X Ray ◽  
X Ray Scattering ◽  
Filler Particles ◽  
Tubular Shape ◽  
Ray Scattering

The electrorheological behavior is significantly affected by the strength of the structure formed in the electric field, due to the filler particles orientation. The structural organization of the filler in electric field was studied by X-ray scattering on paraffin films. Particles of layered aluminosilicates with a high aspect ratio and various morphology such as montmorillonite and halloysite were used as fillers. The differences in the structure formation by fillers of plate and tubular shape were shown.

Fabrication of high aspect ratio nanoscale periodic structures by the soft X-ray interference lithography

2017 ◽  
Vol 170 ◽  
pp. 49-53 ◽  
Author(s):  
Jun Zhao ◽  
Yanqing Wu ◽  
Chaofan Xue ◽  
Shumin Yang ◽  
Liansheng Wang ◽  
...  
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Periodic Structures ◽  
Interference Lithography ◽  
X Ray

Formation of GaN Self-Organized Nanotips by Nanomasking Effect

2001 ◽  
Vol 707 ◽  
Author(s):  
Harumasa Yoshida ◽  
Tatsuhiro Urushido ◽  
Hideto Miyake ◽  
Kazumasa Hiramtsu
Keyword(s):  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Aspect Ratio ◽  
Formation Mechanism ◽  
High Aspect Ratio ◽  
Photoelectron Spectroscopy ◽  
Nanometer Scale ◽  
Xps Analysis ◽  
X Ray ◽  
Self Organized

ABSTRACTWe have successfully fabricated self-organized GaN nanotips by reactive ion etching using chlorine plasma, and have revealed the formation mechanism. Nanotips with a high density and a high aspect ratio have been formed after the etching. We deduce from X-ray photoelectron spectroscopy (XPS) analysis that the nanotip formation is attributed to nanometer-scale masks of SiO2 on GaN. The structures calculated by Monte Carlo simulation of our formation mechanism are very similar to the experimental nanotip structures.

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