Aberration theory and a design method of double-element optical systems

1999 ◽  
Author(s):  
Shin Masui ◽  
Takeshi Namioka
Keyword(s):  
Design Method ◽  
Optical Systems ◽  
Aberration Theory

scholarly journals Nano-imprinted subwavelength gratings as polarizing beamsplitters

2021 ◽  
Vol 17 (1) ◽  
Author(s):  
Julian Wüster ◽  
Yannick Bourgin ◽  
Patrick Feßer ◽  
Arne Behrens ◽  
Stefan Sinzinger
Keyword(s):  
Nanoimprint Lithography ◽  
Optical Measurement ◽  
Design Method ◽  
Optical Systems ◽  
Surface Metrology ◽  
Measurement Systems ◽  
Common Path ◽  
Dielectric Coatings ◽  
Subwavelength Gratings ◽  
Wide Range

AbstractPolarizing beamsplitters have numerous applications in optical systems, such as systems for freeform surface metrology. They are classically manufactured from birefringent materials or with stacks of dielectric coatings. We present a binary subwavelength-structured form-birefringent diffraction grating, which acts as a polarizing beamsplitter for a wide range of incidence angles −30∘…+30∘. We refine the general design method for such hybrid gratings. We furthermore demonstrate the manufacturing steps with Soft-UV-Nanoimprint-Lithography, as well as the experimental verification, that the structure reliably acts as a polarizing beamsplitter. The experimental results show a contrast in efficiency for TE- and TM-polarization of up to 1:18 in the first order, and 34:1 in the zeroth order. The grating potentially enables us to realize integrated compact optical measurement systems, such as common-path interferometers.

Method of calculating the aberrations of soft X-ray and vacuum ultraviolet optical systems

2019 ◽  
Vol 26 (5) ◽  
pp. 1558-1564
Author(s):  
Yiqing Cao ◽  
Zhijuan Shen ◽  
Zhixia Zheng
Keyword(s):  
Optical System ◽  
Vacuum Ultraviolet ◽  
Optical Systems ◽  
Third Order ◽  
Order Accuracy ◽  
X Ray ◽  
Plane Symmetric ◽  
The Third ◽  
Aberration Theory ◽  
Ray Coordinates

Based on the the third-order aberration theory of plane-symmetric optical systems, this paper studies the effect on aberrations of the second-order accuracy of aperture-ray coordinates and the extrinsic aberrations of this kind of optical system; their calculation expressions are derived. The resultant aberration expressions are then applied to calculate the aberrations of two design examples of soft X-ray and vacuum ultraviolet (XUV) optical systems; images are compared with ray-tracing results using SHADOW software to validate the aberration expressions. The study shows that the accuracy of the aberration expressions is satisfactory.

Multi-beam design method for reflectarray antenna using aberration theory

2017 ◽  
Author(s):  
Yoshimi Sunaga ◽  
Kento Takeshima ◽  
Shigeru Makino ◽  
Takeshi Shiode ◽  
Michio Takikawa
Keyword(s):  
Design Method ◽  
Beam Design ◽  
Reflectarray Antenna ◽  
Aberration Theory

Third-order aberration of soft X-ray optical systems with orthogonal and coplanar arrangement of the main planes of elements

2020 ◽  
Vol 27 (6) ◽  
pp. 1477-1484
Author(s):  
Yiqing Cao ◽  
Zhijuan Shen ◽  
Haihe Xie
Keyword(s):  
Optical System ◽  
Optical Systems ◽  
Analysis Method ◽  
Third Order ◽  
Optical Elements ◽  
Analytical Analysis ◽  
X Ray ◽  
Plane Symmetric ◽  
Design And Optimization ◽  
Aberration Theory

A third-order aberration analytical analysis method of soft X-ray optical systems with orthogonal and coplanar arrangement of the main planes of elements is proposed. Firstly, the transfer equations of the aperture ray and the principle ray are derived; then, based on the third-order aberration theory with the aperture-ray coordinates on the reference exit wavefront of a plane-symmetric optical system, the aberration expressions contributed by the wave aberration and defocus of this kind of optical system are studied in detail. Finally, the derived aberration calculation expressions are applied to calculate the aberration of two design examples of such types of optical systems; the images are compared with ray-tracing results obtained using the Shadow software to validate the aberration expressions. The study shows that the accuracy of the aberration expressions is satisfactory. The analytical analysis method of aberration is helpful in the design and optimization of the soft X-ray optical systems with orthogonal and coplanar arrangement of the main planes of optical elements.

Composition of collimating optical systems using aberration theory

2021 ◽  
Vol 88 (5) ◽  
pp. 274
Author(s):  
G. E. Romanova ◽  
Xuanlin Qiao
Keyword(s):  
Optical Systems ◽  
Aberration Theory

Dreidimensional abbildende Elektronenmikroskope II. Theorie elektronenoptischer Systeme mit gekrümmter Achse / Three-dimensionally Imaging Electron Microscopes II. Theory of Electron-optical Systems with a Curved Axis

1978 ◽  
Vol 33 (11) ◽  
pp. 1361-1377 ◽  
Author(s):  
E. Plies ◽  
D. Typke
Keyword(s):  
Electromagnetic Field ◽  
Electromagnetic Fields ◽  
Optical Axis ◽  
Optical Systems ◽  
Integral Expression ◽  
The Third ◽  
Space Charges ◽  
Single Section ◽  
Electron Microscopes ◽  
Aberration Theory

An imaging and aberration theory of electron- or ion-optical systems composed of arbitrary stationary electromagnetic fields without space charges and currents in the beam-occupied region is developed. It follows the theory of systems with a straight optical axis as formulated by H. Rose. The electromagnetic field is expanded into plane multipoles about the arbitrarily curved and twisted axis. In the expansion of the eikonal, all terms are given which are needed for the calculation of the image aberrations up to the third rank (rank = Seidelian order + power of disturbing potentials + power of the chromatic deviation). For the image aberrations of the second rank, an integral expression is given, from which the single aberration integrals may be derived. Systems with single-section symmetry are treated in more detail.

New design method for athermalized optical systems

1992 ◽  
Author(s):  
Yasuhisa Tamagawa ◽  
Satoshi Wakabayashi ◽  
Toru Tajime
Keyword(s):  
Design Method ◽  
Optical Systems
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