Advanced refractory-metal and process technology for the fabrication of x-ray masks

1999 ◽  
Author(s):  
Cameron J. Brooks ◽  
Kenneth C. Racette ◽  
Michael J. Lercel ◽  
Lynn A. Powers ◽  
Douglas E. Benoit
Keyword(s):  
Refractory Metal ◽  
Process Technology ◽  
X Ray

Joining ductile refractory metal inserts in x-ray tube targets

JOM ◽  
1996 ◽  
Vol 48 (1) ◽  
pp. 59-64
Author(s):  
M. R. Eggleston ◽  
M. R. Jackson ◽  
M. G. Benz ◽  
G. Reznikov
Keyword(s):  
Refractory Metal ◽  
X Ray

Forkation and Oxidation of Titanium Silicide

1986 ◽  
Vol 77 ◽  
Author(s):  
Tzuen-Luh Huang ◽  
Shuit-Tong Lee
Keyword(s):  
High Temperature ◽  
Refractory Metal ◽  
Electron Spectroscopy ◽  
Polycrystalline Silicon ◽  
Auger Electron ◽  
Titanium Silicide ◽  
X Ray Diffraction ◽  
X Ray ◽  
Selective Etch ◽  
Furnace Sintering

ABSTRACTRefractory metal suicides have been used widely in VLSI fabrication, owing to their low resistivity, high-temperature compatibility, and oxidiz-ability. In this work, we have studied the titanium suicide formation, using a rapid thermal processor (RTP). Isothermal and isochronal sintering experiments were carried out to determine the appropriate process steps. The selective etch of the unreacted Ti was characterized. The sintered films were characterized by four-point probe, X-ray diffraction, and Auger electron spectroscopy. We also studied the oxidation at 800–1000°C of Ti suicide formed by sintering Ti and polycrystalline silicon using a RTP in N2 ambient. The oxidation results of Ti suicide formed using RTP in N2 ambient are compared with those formed using furnace sintering in vacuum/argon ambient and those deposited by cosputtering.

Imaging Complex Fluids Under Confinement and Flow: Development of Bragg-Fresnel Optics for X-ray Microdiffraction

1996 ◽  
Vol 464 ◽  
Author(s):  
Youli Li ◽  
Stefan H.J. Idziak ◽  
Ernie Caine ◽  
G. Subramanian ◽  
Evelyn Hu ◽  
...  
Keyword(s):  
Complex Fluids ◽  
Incident Beam ◽  
Surface Force ◽  
Spot Size ◽  
Partial Coherence ◽  
Structural Studies ◽  
Process Technology ◽  
X Ray ◽  
Glass Substrates

ABSTRACTWe present results of simultaneous efforts to develop: 1.) Bragg-Fresnel Optics(BFO) to be used in X-ray microdiffraction methods, in particular as applied to structural studies of complex fluids and biomaterials under confinement and flow conditions; and 2.) Methodologies for confining complex fluids and biomaterials for in-situ structural studies. Using microelectronics process technology, we have fabricated linear and circular Bragg-Fresnel Lenses (BFL) in Si and III-V compound semiconductor substrates such as InP, GaAs and GaAs heterostructures with outermost zone width to 0.25 μm. X-ray characterization of linear BFLs were performed on a wiggler beamline at Stanford Synchrotron Radiation Laboratory (SSRL) at x-ray energies of 8 keV and 16 keV. A ∼5 μm focal spot size was obtained with a 50 μm incident beam, which was determined by the partial coherence of the source. On the confinement techniques, we have developed the X-ray Surface Force Apparatus (XSFA) which allows in-situ x-ray diffraction measurements to be made on fluid thin films confined between two atomically smooth surfaces. A new approach is being pursued to study the effects of confinement and flow on complex fluids and biological materials using microchannels fabricated on glass substrates.

Development of Nanocrystalline Copper-Refractory Metal Alloys

2007 ◽  
Vol 561-565 ◽  
pp. 2373-2378 ◽  
Author(s):  
J.M. Rigsbee
Keyword(s):  
Electron Microscopy ◽  
Vapor Deposition ◽  
Refractory Metal ◽  
Physical Vapor Deposition ◽  
Strength Loss ◽  
Strength Properties ◽  
Metal Alloys ◽  
X Ray ◽  
Precipitate Coarsening ◽  
Refractory Metal Alloys

Precipitation-strengthened Cu-based alloys have limited use as structural materials at high temperatures due to precipitate coarsening and strength loss. We have recently shown that Curefractory metal alloys produced by various physical vapor deposition methods have stable, nanocrystalline microstructures and maintain their strength properties even when annealed at temperatures as high as 900 C for up to 100 hours. This paper presents discussions of how these alloys are processed and the resulting microstructures. X-ray and electron microscopy results will be presented to document the phase transformations that occur in these alloys and result in such exceptionally stable microstructures.

Study of Wsi2 and Cosi2 Thin Films Deposited by Laser Ablation

1994 ◽  
Vol 354 ◽  
Author(s):  
V.G. Glebovsky ◽  
S.N. Ermolov ◽  
R.A. Oganyan ◽  
E.D. Stinov
Keyword(s):  
Thin Films ◽  
Laser Ablation ◽  
Elemental Composition ◽  
Refractory Metal ◽  
Liquid State ◽  
Electric Resistance ◽  
Cobalt Disilicide ◽  
X Ray ◽  
Specific Electric Resistance

AbstractIt has been shown, that pure massive targets of tungsten and cobalt disilicide can be obtain from the liquid state by means of a set of metallurgical methods. The conditions of laser ablation of the targets ensuring the preparation of tungsten and cobalt suicide films of the specific electric resistance 50 and 30 μΩ cm respectivly have been studied. The grazing beam X-ray difractometry were used to investigate their phase and elemental composition of the films. The method in question has been shown to be promising for the preparation of films of other refractory - metal suicides.

Application of XRF and AMS Techniques to Textiles in the Mongol Empire

2007 ◽  
Vol 1047 ◽  
Author(s):  
Tomoko Katayama ◽  
Ari Ide-Ektessabi ◽  
Kazuki Funahashi ◽  
Ryoichi Nishimura
Keyword(s):  
Mass Spectrometry ◽  
Accelerator Mass Spectrometry ◽  
Fluorescence Analysis ◽  
Process Technology ◽  
X Ray ◽  
Central Asian ◽  
Sr Xrf ◽  
High Resolution Images ◽  
Mongol Empire ◽  
Constituent Elements

AbstractX-ray fluorescence (XRF) and Accelerator Mass Spectrometry (AMS) techniques were applied to four pieces of ancient Mongolian textiles in order to assist cultural studies of the most significant era of medieval western Asian culture. Radiocarbon dating using Accelerator Mass Spectrometry (AMS) was performed in order to determine the historical age of these pieces. Then, X-ray fluorescence analysis using Synchrotron Radiation (SR-XRF) was carried out in order to obtain elemental maps as well as investigate their constituent elements. Results showed that the textiles were produced between13th and 14th century, and possessed elements such as Au, Cu, Fe and Ti were traced in these pieces whereas Au was used to make gold threads. Cu, Fe and Ti are well known as metallic mordant. In addition, high resolution images were obtained using Scanning Electron Microscope (SEM) to observe the textile structure and their weaving conditions. The whole collected data can assist in bringing into light and facilitate a deeper understanding of the medieval Mongolian cultures, the textile technology, staining techniques, material process technology of the Mongolian Empire and their relations with the neighboring east and central Asian cultures, such as Persia, India and China.

scholarly journals PHASE EQUILIBRIA IN THE NaCl–CaCl2–CaO SYSTEM

2021 ◽  
Vol 87 (2) ◽  
pp. 77-86
Author(s):  
Anatoliy Omelchuk ◽  
Igor Skryptun ◽  
Nikolay Zakharchenko ◽  
Olha Bosenko ◽  
Ruslan Savchuk ◽  
...  
Keyword(s):  
Ternary System ◽  
Phase Equilibria ◽  
Metal Oxides ◽  
Calcium Oxide ◽  
Refractory Metal ◽  
Polythermal Section ◽  
X Ray ◽  
Polythermal Sections ◽  
Solid Phases ◽  
Liquid And Solid Phases

The phase equilibria of the ternary system CaCl2 – NaCl – CaO in the area which enriched of calcium and sodium chloride were investigated by the methods of differential-thermal analysis and powder X-ray phase analysis. In the systems were determined the equilibrium concentration of calcium oxide and the composition of the phases, which at the same time exist in an equilibrium state at different temperatures. The surfaces of liquidus and solidus were established, the compositions of the sections of the ternary system CaCl2–NaCl–CaO were defined, which recommended for electrochemical reduction of refractory metal oxides (titanium, zirconium and other), which allow electrolysis in the temperature range from 550 to 1000 °С. Five polythermal sections of the NaCl – CaCl2 – CaO ternary system were studied. For each polythermal section the regions of existence of the liquid and solid phases were established. For each polythermal section state diagrams were constructed. Used X-Ray phase analyses it was established the compositions of liquid and solid phases for each polythermal sections. The phases of which the system consists were determined. At a constant ratio of components [NaCl]:[CaCl2] = 1.06 (mol.) in the melts of the ternary system CaCl2 – NaCl – CaO, the equilibrium content of calcium oxide reaches 12.0 mol.%, while their crystallization temperature does not exceed 550 °C. This allows us to recommend mixtures of this composition for electrochemical reduction of refractory metal oxides in a wide range of temperatures (from 550 to 1000 °C) with a high content of both calcium and sodium chlorides (not less than 40 mol.%) and oxide. calcium (up to 12.0 mol.%). The eutectic of this ternary system has a melting point of 480 ° C and corresponds to he composition (mol.%): CaCl2 (45.8) – NaCl (47.0) – CaO (7.2).

Refinement of Crystallographic Parameters in Refractory Metal Disilicides

2000 ◽  
Vol 646 ◽  
Author(s):  
K. Tanaka ◽  
K. Nawata ◽  
H. Inui ◽  
M. Yamaguchi ◽  
M. Koiwa
Keyword(s):  
Refractory Metal ◽  
Interatomic Distance ◽  
X Ray Diffraction ◽  
Space Group ◽  
X Ray ◽  
Lattice Constants ◽  
Metal Atoms ◽  
Crystallographic Structures ◽  
Atomic Parameters ◽  
The Ideal

ABSTRACTThe crystallographic structures of seven refractory metal (Ti, V, Cr, Nb, Mo, Ta and W) disilicides with the C11b, C40 and C54 structures have been refined through analysis of single-crystal X-ray diffraction data. Crystallographic parameters refined are lattice constants, atomic parameters and the space group of the C40 disilicides. In most of previous studies, silicon atoms have been considered to locate at the ideal positions so that the refractory metal atoms are perfectly six-fold coordinated in RSi2 layers prevailing in all the three structures. The present analysis shows that the silicon atoms are displaced from the ideal positions. The magnitude of such displacement is found to be closely related to the interatomic distance in these pseudo-hexagonally arranged RSi2 layers. The space group of three of the four C40 disilicides, VSi2, CrSi2 and TaSi2, is determined to be P6422, which is of chirality with respect to that (P6222) assigned in the previous studies.

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