New photoresist stripper and a system for recycling it

1999 ◽  
Author(s):  
Hideki Nishida ◽  
Hiroshi Kikuchi ◽  
Kensuke Yano ◽  
Hiroyasu Matsuda
Keyword(s):  
Photoresist Stripper

Design and modeling of optimal distillation sequence for recovery of valuable components from a waste photoresist stripper

2014 ◽  
Vol 18 (2) ◽  
pp. 366-376 ◽  
Author(s):  
Yus Donald Chaniago ◽  
Jae-Kyeong Kim ◽  
Myung-Jun Park ◽  
Kee-Kahb Koo ◽  
Moonyong Lee
Keyword(s):  
Photoresist Stripper

Room Temperature Photoresist Stripper

1997 ◽  
Vol 144 (11) ◽  
pp. 4005-4018 ◽  
Author(s):  
Senri Ojima ◽  
Takayuki Jizaimaru ◽  
Shunkiti Omae ◽  
Tadahiro Ohmi
Keyword(s):  
Room Temperature ◽  
Photoresist Stripper

Electrochemical Corrosion Inhibition System for Photoresist Stripper for New Copper FPD Manufacturing

2007 ◽  
Vol 990 ◽  
Author(s):  
Seiji Inaoka ◽  
Sang In Kim
Keyword(s):  
Corrosion Inhibitor ◽  
Corrosion Inhibition ◽  
Corrosion Inhibitors ◽  
Electrochemical Corrosion ◽  
Inhibition Mechanism ◽  
Copper Corrosion ◽  
Photoresist Stripper ◽  
Copper Corrosion Inhibition

ABSTRACTDevelopment of photoresist stripper with copper compatibility is challenging as conventional corrosion inhibitors do not protect the metal as expected. Copper corrosion inhibition mechanism of newly developed photoresist stripper is proposed that significantly reduces copper corrosion with small amount of corrosion inhibitor.

Recovery of 1-hydroxyethylpiperazine and Methyl Diglycol from a Waste Photoresist Stripper by Vacuum Distillation

2013 ◽  
Vol 30 (6) ◽  
pp. 520-528 ◽  
Author(s):  
Jae-Kyeong Kim ◽  
◽  
Myung-Jun Park ◽  
Moonyong Lee ◽  
Kee-Kahb Koo
Keyword(s):  
Vacuum Distillation ◽  
Photoresist Stripper

Recent Pollution Prevention Research In III-V Device Manufacturing At Hewlett-Packard

1994 ◽  
Vol 344 ◽  
Author(s):  
Douglas B. Shire
Keyword(s):  
Hazardous Waste ◽  
Pollution Prevention ◽  
Waste Reduction ◽  
Waste Minimization ◽  
Production Volume ◽  
Total Production ◽  
Glycol Ethers ◽  
Time Period ◽  
Photoresist Stripper ◽  
Ethylene Glycol Ethers

AbstractSeveral coordinated hazardous waste minimization projects have been undertaken at our facilities involved in III-V device manufacturing. These include modifications to existing processes to reduce or eliminate emissions of CFCs, 1,1,1-TCA, xylenes, ethylene glycol ethers, 1,2,4-trichlorobenzene (in photoresist stripper), and other compounds. These issues are addressed in turn, noting the unique aspects of GaAs and GaP device manufacture that need to be taken into account. Goals achieved have been complete cessation of CFC and 1,1,1-TCA use and 33% reductions in xylene and 1,2,4-trichlorobenzene usage since 1990, despite significant increases in total production volume during the same time period. Specific strategies are also described for tracking chemical use and sharing best practices for hazardous waste reduction across functional groups.

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