Electron-beam lithography simulation for mask making: III. Effect of spot size, address grid, and raster writing strategies on lithography performance with PBS and ZEP-7000

Mapping Intimacies ◽

10.1117/12.332813 ◽

1998 ◽

Author(s):

Chris A. Mack

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Spot Size ◽

Writing Strategies ◽

Lithography Simulation ◽

Mask Making

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Electron-beam lithography simulation for mask making: III. Effect of spot size, address grid, and raster writing strategies on lithography performance with PBS and ZEP-7000

10.1117/12.360238 ◽

1999 ◽

Author(s):

Chris A. Mack

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Spot Size ◽

Writing Strategies ◽

Lithography Simulation ◽

Mask Making

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Electron-beam lithography simulation for mask making: VI. Comparison of 10- and 50-kV GHOST proximity effect correction

10.1117/12.438354 ◽

2001 ◽

Cited By ~ 1

Author(s):

Chris A. Mack

Keyword(s):

Electron Beam ◽

Proximity Effect ◽

Electron Beam Lithography ◽

Lithography Simulation ◽

Mask Making ◽

Proximity Effect Correction

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Electron-beam lithography simulation for mask making: II. Comparison of the lithographic performance of PBS and EBR 900-M1

10.1117/12.301214 ◽

1997 ◽

Author(s):

Charles A. Sauer ◽

David W. Alexander ◽

Chris A. Mack

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Lithography Simulation ◽

Mask Making

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Electron-beam lithography simulation for mask making: I

10.1117/12.301194 ◽

1997 ◽

Author(s):

Chris A. Mack

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Lithography Simulation ◽

Mask Making

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Electron beam lithography simulation for mask making

Microelectronic Engineering ◽

10.1016/s0167-9317(99)00082-9 ◽

1999 ◽

Vol 46 (1-4) ◽

pp. 283-286 ◽

Cited By ~ 4

Author(s):

Chris A. Mack

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Lithography Simulation ◽

Mask Making

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Electron-beam lithography simulation for mask making: V. Impact of GHOST proximity effect correction on process window

10.1117/12.373314 ◽

1999 ◽

Author(s):

Chris A. Mack ◽

Charles A. Sauer

Keyword(s):

Electron Beam ◽

Proximity Effect ◽

Electron Beam Lithography ◽

Process Window ◽

Lithography Simulation ◽

Mask Making ◽

Proximity Effect Correction

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Application of the partial wave expansion method in 3-D low energy electron beam lithography simulation

Microelectronic Engineering ◽

10.1016/s0167-9317(01)00499-3 ◽

2001 ◽

Vol 57-58 ◽

pp. 297-302 ◽

Cited By ~ 4

Author(s):

X. Zianni ◽

D. Velessiotis ◽

N. Glezos ◽

K.N. Trohidou

Keyword(s):

Electron Beam ◽

Partial Wave ◽

Electron Beam Lithography ◽

Expansion Method ◽

Low Energy ◽

Energy Electron ◽

Partial Wave Expansion ◽

Lithography Simulation ◽

Wave Expansion ◽

Low Energy Electron

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Electron beam lithography writing strategies for low loss, high confinement silicon optical waveguides

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.3653266 ◽

2011 ◽

Vol 29 (6) ◽

pp. 06F309 ◽

Cited By ~ 84

Author(s):

Richard J. Bojko ◽

Jing Li ◽

Li He ◽

Tom Baehr-Jones ◽

Michael Hochberg ◽

...

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Optical Waveguides ◽

Writing Strategies ◽

Low Loss

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Analysis of Fitness Functions for Electron-Beam Lithography Simulation and Evolutionary Optimization

IEEE Transactions on Evolutionary Computation ◽

10.1109/tevc.2004.834198 ◽

2004 ◽

Vol 8 (5) ◽

pp. 506-511

Author(s):

F. Robin ◽

E. Moreno

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Evolutionary Optimization ◽

Fitness Functions ◽

Lithography Simulation

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Electron beam lithography simulation for sub-10 nm patterning

Japanese Journal of Applied Physics ◽

10.7567/jjap.53.06jb02 ◽

2014 ◽

Vol 53 (6S) ◽

pp. 06JB02 ◽

Cited By ~ 9

Author(s):

Katsushi Michishita ◽

Masaaki Yasuda ◽

Hiroaki Kawata ◽

Yoshihiko Hirai

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Lithography Simulation

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