Applications of dielectric thin film by electron cyclotron resonance plasma chemical vapor deposition for semiconductor photoelectronic devices

Mapping Intimacies ◽

10.1117/12.319623 ◽

1998 ◽

Author(s):

Dongsheng Mao ◽

Manqing Tan ◽

Lianhui Chen

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Plasma Chemical ◽

Dielectric Thin Film ◽

Plasma Chemical Vapor Deposition ◽

Resonance Plasma

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Radical Fluxes in Electron Cyclotron Resonance Plasma Chemical Vapor Deposition of Amorphous Silicon

Japanese Journal of Applied Physics ◽

10.1143/jjap.34.5965 ◽

1995 ◽

Vol 34 (Part 1, No. 11) ◽

pp. 5965-5970 ◽

Cited By ~ 3

Author(s):

Mei Zhang ◽

Yoshikazu Nakayama

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Resonance Plasma

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Behavior of charged particles in an electron cyclotron resonance plasma chemical vapor deposition reactor

Applied Physics Letters ◽

10.1063/1.103892 ◽

1990 ◽

Vol 57 (22) ◽

pp. 2297-2299 ◽

Cited By ~ 4

Author(s):

Yoshikazu Nakayama ◽

Mitsuru Kondoh ◽

Kohji Hitsuishi ◽

Mei Zhang ◽

Takao Kawamura

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Charged Particles ◽

Chemical Vapor ◽

Plasma Chemical ◽

Chemical Vapor Deposition Reactor ◽

Plasma Chemical Vapor Deposition ◽

Resonance Plasma

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Dielectric thin film deposition by electron cyclotron resonance plasma chemical vapor deposition for optoelectronics

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.587140 ◽

1994 ◽

Vol 12 (1) ◽

pp. 433 ◽

Cited By ~ 22

Author(s):

Steven Dzioba

Keyword(s):

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Thin Film Deposition ◽

Film Deposition ◽

Plasma Chemical ◽

Dielectric Thin Film ◽

Plasma Chemical Vapor Deposition ◽

Resonance Plasma

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Low‐Temperature Si Epitaxial Growth by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition

Journal of The Electrochemical Society ◽

10.1149/1.2069532 ◽

1992 ◽

Vol 139 (7) ◽

pp. 1983-1988 ◽

Cited By ~ 3

Author(s):

Naoki Kasai ◽

Nobuhiro Endo

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Epitaxial Growth ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Resonance Plasma

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Study on the electron cyclotron resonance plasma chemical vapor deposition of carbon nanotubes

Materials Science and Engineering B ◽

10.1016/j.mseb.2007.03.008 ◽

2007 ◽

Vol 140 (1-2) ◽

pp. 44-47

Author(s):

Zhi Wang ◽

Dechun Ba ◽

Peijiang Cao ◽

ChunhongYu ◽

Ji Liang

Keyword(s):

Carbon Nanotubes ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Resonance Plasma

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A Study on the Relation between Film Quality and Deposition Rate for Amorphous Silicon Films Grown by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition Using H 2/SiH 4

Japanese Journal of Applied Physics ◽

10.1143/jjap.36.l986 ◽

1997 ◽

Vol 36 (Part 2, No. 8A) ◽

pp. L986-L988

Author(s):

Moonsang Kang ◽

Jaeyeong Kim ◽

Taehoon Lim ◽

Inhwan Oh ◽

Bupju Jeon ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Deposition Rate ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Resonance Plasma

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Electron cyclotron resonance plasma chemical vapor deposition for rugate film manufacturing

10.1117/12.192121 ◽

1994 ◽

Cited By ~ 1

Author(s):

Pavel V. Bulkin ◽

Pieter L. Swart ◽

Beatrys M. Lacquet

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Plasma Chemical ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Chemical Vapor Deposition ◽

Resonance Plasma

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Epitaxial growth of silicon at low temperature by ultrahigh vacuum electron cyclotron resonance plasma chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.342429 ◽

1988 ◽

Vol 64 (10) ◽

pp. 5183-5188 ◽

Cited By ~ 31

Author(s):

I. Nagai ◽

T. Takahagi ◽

A. Ishitani ◽

H. Kuroda ◽

M. Yoshikawa

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Epitaxial Growth ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Resonance Plasma

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SiCN alloys deposited by electron cyclotron resonance plasma chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.117887 ◽

1996 ◽

Vol 69 (6) ◽

pp. 773-775 ◽

Cited By ~ 89

Author(s):

F. J. Gómez ◽

P. Prieto ◽

E. Elizalde ◽

J. Piqueras

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Plasma Chemical ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Chemical Vapor Deposition ◽

Resonance Plasma

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Microcrystalline Silicon Films Deposited by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition Using Helium Gas

Japanese Journal of Applied Physics ◽

10.1143/jjap.35.l1241 ◽

1996 ◽

Vol 35 (Part 2, No. 10A) ◽

pp. L1241-L1244 ◽

Cited By ~ 12

Author(s):

Kyung Eon Lee ◽

Wook Hyoung Lee ◽

Sung-Chul Shin ◽

Choochon Lee

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Microcrystalline Silicon ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Helium Gas ◽

Resonance Plasma

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