Theoretical model for the reactive pulsed deposition process: application to the case of ablation of a Ti target in low-pressure N 2

1998 ◽  
Author(s):  
Johny Neamtu ◽  
Ion N. Mihailescu
Soft Matter ◽  
2019 ◽  
Vol 15 (17) ◽  
pp. 3580-3587 ◽  
Author(s):  
Anna Zigelman ◽  
Mohammad Abo Jabal ◽  
Ofer Manor

We employ a theoretical model to explain the wetting–dewetting motion of the contact line by incorporating opposing evaporation and Marangoni induced flows in the deposition process.


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