Fabrication of biological detection chip based polymer nanostructures via nanoimprint lithography

2021 ◽  
Author(s):  
Man Zhang ◽  
Cheng Shan ◽  
Liangping Xia ◽  
Suihu Dang ◽  
Mengting Zeng ◽  
...  
Keyword(s):  
Nanoimprint Lithography ◽  
Biological Detection ◽  
Polymer Nanostructures

Hybrid-polymer nanostructures forming an anti-reflection film using two-beam interference and ultraviolet nanoimprint lithography

2009 ◽  
Vol 86 (4-6) ◽  
pp. 874-877 ◽  
Author(s):  
Tien-Li Chang ◽  
Kuei-Yuan Cheng ◽  
Ta-Hsin Chou ◽  
Chih-Chieh Su ◽  
Han-Ping Yang ◽  
...  
Keyword(s):  
Nanoimprint Lithography ◽  
Hybrid Polymer ◽  
Polymer Nanostructures

scholarly journals Enhanced Thermal Stability of Thermoplastic Polymer Nanostructures for Nanoimprint Lithography

Materials ◽  
2019 ◽  
Vol 12 (3) ◽  
pp. 545 ◽  
Author(s):  
Youwei Jiang ◽  
Bingqing Luo ◽  
Xing Cheng
Keyword(s):  
Thermal Stability ◽  
Glass Transition ◽  
Nanoimprint Lithography ◽  
Polymer Melt ◽  
Thermoplastic Polymer ◽  
Precise Control ◽  
Polymer Nanostructures ◽  
Thin Polymer ◽  
The Time Domain ◽  
Thermal Stability Of

Thermoplastic polymer micro- and nanostructures suffer pattern decay when heated to a temperature close to or above the polymer’s glass transition temperature. In this work, we report enhanced thermal stability of polycarbonate nanostructures at temperatures well above their glass transition temperatures. Based on this observation, we develop a unique technique for high-resolution polymer patterning by polymer reflows. This technique is characterized as the precise control of polymer reflows regardless of the annealing time, which avoids the time-domain nonlinear reflow of the polymer melt. We also implement thermal nanoimprinting in a step-and-repeat fashion, which dramatically increases the throughput of the thermal nanoimprint. The enhanced pattern stability against thermal reflow also allows for multiple imprinting at the same location to generate complex resist patterns from a simple mold structure. Since modern lithography often uses thin resist films (sub-100 nm) due to the restraint from the pattern aspect ratio, the unusual annealing behavior of thin polymer films is highly relevant in sub-100 nm lithographic processing.

Fabrication of ferroelectric polymer nanostructures on flexible substrates by soft-mold reverse nanoimprint lithography

2015 ◽  
Vol 27 (1) ◽  
pp. 015302 ◽  
Author(s):  
Jingfeng Song ◽  
Haidong Lu ◽  
Shumin Li ◽  
Li Tan ◽  
Alexei Gruverman ◽  
...  
Keyword(s):  
Nanoimprint Lithography ◽  
Flexible Substrates ◽  
Ferroelectric Polymer ◽  
Polymer Nanostructures ◽  
Soft Mold

scholarly journals Charged particle single nanometre manufacturing

2018 ◽  
Vol 9 ◽  
pp. 2855-2882 ◽  
Author(s):  
Philip D Prewett ◽  
Cornelis W Hagen ◽  
Claudia Lenk ◽  
Steve Lenk ◽  
Marcus Kaestner ◽  
...  
Keyword(s):  
Charged Particle ◽  
High Throughput ◽  
Nanoimprint Lithography ◽  
Ion Beam ◽  
Ambient Air ◽  
Particle Beam ◽  
Vacuum System ◽  
Scanning Tunneling ◽  
Tunneling Microscopy ◽  
Charged Particle Beam

Following a brief historical summary of the way in which electron beam lithography developed out of the scanning electron microscope, three state-of-the-art charged-particle beam nanopatterning technologies are considered. All three have been the subject of a recently completed European Union Project entitled “Single Nanometre Manufacturing: Beyond CMOS”. Scanning helium ion beam lithography has the advantages of virtually zero proximity effect, nanoscale patterning capability and high sensitivity in combination with a novel fullerene resist based on the sub-nanometre C60 molecule. The shot noise-limited minimum linewidth achieved to date is 6 nm. The second technology, focused electron induced processing (FEBIP), uses a nozzle-dispensed precursor gas either to etch or to deposit patterns on the nanometre scale without the need for resist. The process has potential for high throughput enhancement using multiple electron beams and a system employing up to 196 beams is under development based on a commercial SEM platform. Among its potential applications is the manufacture of templates for nanoimprint lithography, NIL. This is also a target application for the third and final charged particle technology, viz. field emission electron scanning probe lithography, FE-eSPL. This has been developed out of scanning tunneling microscopy using lower-energy electrons (tens of electronvolts rather than the tens of kiloelectronvolts of the other techniques). It has the considerable advantage of being employed without the need for a vacuum system, in ambient air and is capable of sub-10 nm patterning using either developable resists or a self-developing mode applicable for many polymeric resists, which is preferred. Like FEBIP it is potentially capable of massive parallelization for applications requiring high throughput.

Fabrication of metallic SPM tips by combining UV nanoimprint lithography and focused ion beam processing

2010 ◽  
Vol 87 (5-8) ◽  
pp. 1123-1126 ◽  
Author(s):  
J.D. Jambreck ◽  
H. Schmitt ◽  
B. Amon ◽  
M. Rommel ◽  
A.J. Bauer ◽  
...  
Keyword(s):  
Nanoimprint Lithography ◽  
Focused Ion Beam ◽  
Ion Beam

scholarly journals Mastering of NIL Stamps with Undercut T-Shaped Features from Single Layer to Multilayer Stamps

Nanomaterials ◽  
2021 ◽  
Vol 11 (4) ◽  
pp. 956
Author(s):  
Philipp Taus ◽  
Adrian Prinz ◽  
Heinz D. Wanzenboeck ◽  
Patrick Schuller ◽  
Anton Tsenov ◽  
...  
Keyword(s):  
Electron Beam Lithography ◽  
Nanoimprint Lithography ◽  
Silicon Oxide ◽  
Three Dimensional ◽  
Single Layer ◽  
Fabrication Technology ◽  
Large Area ◽  
Structural Colors ◽  
Biomimetic Structures ◽  
Morpho Butterfly

Biomimetic structures such as structural colors demand a fabrication technology of complex three-dimensional nanostructures on large areas. Nanoimprint lithography (NIL) is capable of large area replication of three-dimensional structures, but the master stamp fabrication is often a bottleneck. We have demonstrated different approaches allowing for the generation of sophisticated undercut T-shaped masters for NIL replication. With a layer-stack of phase transition material (PTM) on poly-Si, we have demonstrated the successful fabrication of a single layer undercut T-shaped structure. With a multilayer-stack of silicon oxide on silicon, we have shown the successful fabrication of a multilayer undercut T-shaped structures. For patterning optical lithography, electron beam lithography and nanoimprint lithography have been compared and have yielded structures from 10 µm down to 300 nm. The multilayer undercut T-shaped structures closely resemble the geometry of the surface of a Morpho butterfly, and may be used in future to replicate structural colors on artificial surfaces.

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