Nanoimprint Lithography of Parallel Patterning of Nanoscale Magnetoelectronic Devices

2002 ◽  
Author(s):  
Linshu Kong ◽  
Larry Koecher
Keyword(s):  
Nanoimprint Lithography

scholarly journals Charged particle single nanometre manufacturing

2018 ◽  
Vol 9 ◽  
pp. 2855-2882 ◽  
Author(s):  
Philip D Prewett ◽  
Cornelis W Hagen ◽  
Claudia Lenk ◽  
Steve Lenk ◽  
Marcus Kaestner ◽  
...  
Keyword(s):  
Charged Particle ◽  
High Throughput ◽  
Nanoimprint Lithography ◽  
Ion Beam ◽  
Ambient Air ◽  
Particle Beam ◽  
Vacuum System ◽  
Scanning Tunneling ◽  
Tunneling Microscopy ◽  
Charged Particle Beam

Following a brief historical summary of the way in which electron beam lithography developed out of the scanning electron microscope, three state-of-the-art charged-particle beam nanopatterning technologies are considered. All three have been the subject of a recently completed European Union Project entitled “Single Nanometre Manufacturing: Beyond CMOS”. Scanning helium ion beam lithography has the advantages of virtually zero proximity effect, nanoscale patterning capability and high sensitivity in combination with a novel fullerene resist based on the sub-nanometre C60 molecule. The shot noise-limited minimum linewidth achieved to date is 6 nm. The second technology, focused electron induced processing (FEBIP), uses a nozzle-dispensed precursor gas either to etch or to deposit patterns on the nanometre scale without the need for resist. The process has potential for high throughput enhancement using multiple electron beams and a system employing up to 196 beams is under development based on a commercial SEM platform. Among its potential applications is the manufacture of templates for nanoimprint lithography, NIL. This is also a target application for the third and final charged particle technology, viz. field emission electron scanning probe lithography, FE-eSPL. This has been developed out of scanning tunneling microscopy using lower-energy electrons (tens of electronvolts rather than the tens of kiloelectronvolts of the other techniques). It has the considerable advantage of being employed without the need for a vacuum system, in ambient air and is capable of sub-10 nm patterning using either developable resists or a self-developing mode applicable for many polymeric resists, which is preferred. Like FEBIP it is potentially capable of massive parallelization for applications requiring high throughput.

Fabrication of metallic SPM tips by combining UV nanoimprint lithography and focused ion beam processing

2010 ◽  
Vol 87 (5-8) ◽  
pp. 1123-1126 ◽  
Author(s):  
J.D. Jambreck ◽  
H. Schmitt ◽  
B. Amon ◽  
M. Rommel ◽  
A.J. Bauer ◽  
...  
Keyword(s):  
Nanoimprint Lithography ◽  
Focused Ion Beam ◽  
Ion Beam

scholarly journals Mastering of NIL Stamps with Undercut T-Shaped Features from Single Layer to Multilayer Stamps

Nanomaterials ◽  
2021 ◽  
Vol 11 (4) ◽  
pp. 956
Author(s):  
Philipp Taus ◽  
Adrian Prinz ◽  
Heinz D. Wanzenboeck ◽  
Patrick Schuller ◽  
Anton Tsenov ◽  
...  
Keyword(s):  
Electron Beam Lithography ◽  
Nanoimprint Lithography ◽  
Silicon Oxide ◽  
Three Dimensional ◽  
Single Layer ◽  
Fabrication Technology ◽  
Large Area ◽  
Structural Colors ◽  
Biomimetic Structures ◽  
Morpho Butterfly

Biomimetic structures such as structural colors demand a fabrication technology of complex three-dimensional nanostructures on large areas. Nanoimprint lithography (NIL) is capable of large area replication of three-dimensional structures, but the master stamp fabrication is often a bottleneck. We have demonstrated different approaches allowing for the generation of sophisticated undercut T-shaped masters for NIL replication. With a layer-stack of phase transition material (PTM) on poly-Si, we have demonstrated the successful fabrication of a single layer undercut T-shaped structure. With a multilayer-stack of silicon oxide on silicon, we have shown the successful fabrication of a multilayer undercut T-shaped structures. For patterning optical lithography, electron beam lithography and nanoimprint lithography have been compared and have yielded structures from 10 µm down to 300 nm. The multilayer undercut T-shaped structures closely resemble the geometry of the surface of a Morpho butterfly, and may be used in future to replicate structural colors on artificial surfaces.

scholarly journals Nano-imprinted subwavelength gratings as polarizing beamsplitters

2021 ◽  
Vol 17 (1) ◽  
Author(s):  
Julian Wüster ◽  
Yannick Bourgin ◽  
Patrick Feßer ◽  
Arne Behrens ◽  
Stefan Sinzinger
Keyword(s):  
Nanoimprint Lithography ◽  
Optical Measurement ◽  
Design Method ◽  
Optical Systems ◽  
Surface Metrology ◽  
Measurement Systems ◽  
Common Path ◽  
Dielectric Coatings ◽  
Subwavelength Gratings ◽  
Wide Range

AbstractPolarizing beamsplitters have numerous applications in optical systems, such as systems for freeform surface metrology. They are classically manufactured from birefringent materials or with stacks of dielectric coatings. We present a binary subwavelength-structured form-birefringent diffraction grating, which acts as a polarizing beamsplitter for a wide range of incidence angles −30∘…+30∘. We refine the general design method for such hybrid gratings. We furthermore demonstrate the manufacturing steps with Soft-UV-Nanoimprint-Lithography, as well as the experimental verification, that the structure reliably acts as a polarizing beamsplitter. The experimental results show a contrast in efficiency for TE- and TM-polarization of up to 1:18 in the first order, and 34:1 in the zeroth order. The grating potentially enables us to realize integrated compact optical measurement systems, such as common-path interferometers.

scholarly journals High laser induced damage threshold photoresists for nano-imprint and 3D multi-photon lithography

Nanophotonics ◽  
2021 ◽  
Vol 0 (0) ◽  
Author(s):  
Elmina Kabouraki ◽  
Vasileia Melissinaki ◽  
Amit Yadav ◽  
Andrius Melninkaitis ◽  
Konstantina Tourlouki ◽  
...  
Keyword(s):  
Nanoimprint Lithography ◽  
Three Dimensional ◽  
Damage Threshold ◽  
Laser Pulses ◽  
Intense Laser ◽  
Optical Elements ◽  
Photonic Circuits ◽  
Future Production ◽  
Intense Laser Pulses ◽  
Laser Induced Damage

Abstract Optics manufacturing technology is predicted to play a major role in the future production of integrated photonic circuits. One of the major drawbacks in the realization of photonic circuits is the damage of optical materials by intense laser pulses. Here, we report on the preparation of a series of organic–inorganic hybrid photoresists that exhibit enhanced laser-induced damage threshold. These photoresists showed to be candidates for the fabrication of micro-optical elements (MOEs) using three-dimensional multiphoton lithography. Moreover, they demonstrate pattern ability by nanoimprint lithography, making them suitable for future mass production of MOEs.

scholarly journals UV Nanoimprint Lithography: Geometrical Impact on Filling Properties of Nanoscale Patterns

Nanomaterials ◽  
2021 ◽  
Vol 11 (3) ◽  
pp. 822
Author(s):  
Christine Thanner ◽  
Martin Eibelhuber
Keyword(s):  
Layer Thickness ◽  
Process Parameters ◽  
Nanoimprint Lithography ◽  
Failure Modes ◽  
Production Method ◽  
Efficient Production ◽  
Comprehensive Overview ◽  
Replication Method ◽  
Wide Range ◽  
Pattern Size

Ultraviolet (UV) Nanoimprint Lithography (NIL) is a replication method that is well known for its capability to address a wide range of pattern sizes and shapes. It has proven to be an efficient production method for patterning resist layers with features ranging from a few hundred micrometers and down to the nanometer range. Best results can be achieved if the fundamental behavior of the imprint resist and the pattern filling are considered by the equipment and process parameters. In particular, the material properties and pattern size and shape play a crucial role. For capillary force-driven filling behavior it is important to understand the influencing parameters and respective failure modes in order to optimize the processes for reliable full wafer manufacturing. In this work, the nanoimprint results obtained for different pattern geometries are compared with respect to pattern quality and residual layer thickness: The comprehensive overview of the relevant process parameters is helpful for setting up NIL processes for different nanostructures with minimum layer thickness.

scholarly journals Design of mid-infrared filter array based on plasmonic metal nanodiscs array and its application to on-chip spectrometer

2021 ◽  
Vol 11 (1) ◽  
Author(s):  
Hwa-Seub Lee ◽  
Gyu-Weon Hwang ◽  
Tae-Yeon Seong ◽  
Jongkil Park ◽  
Jae Wook Kim ◽  
...  
Keyword(s):  
Nanoimprint Lithography ◽  
Filter Design ◽  
Reconstruction Technique ◽  
Filter Function ◽  
Promising Alternative ◽  
Mid Infrared ◽  
Spectrum Reconstruction ◽  
Filter Array ◽  
On Chip ◽  
Multispectral Filter Array

AbstractMid-infrared wavelengths are called the molecular fingerprint region because it contains the fundamental vibrational modes inherent to the substances of interest. Since the mid-infrared spectrum can provide non-destructive identification and quantitative analysis of unknown substances, miniaturized mid-infrared spectrometers for on-site diagnosis have attained great concern. Filter-array based on-chip spectrometer has been regarded as a promising alternative. In this study, we explore a way of applying a pillar-type plasmonic nanodiscs array, which is advantageous not only for excellent tunability of resonance wavelength but also for 2-dimensional integration through a single layer process, to the multispectral filter array for the on-chip spectrometer. We theoretically and experimentally investigated the optical properties of multi-periodic triangular lattices of metal nanodiscs array that act as stopband filters in the mid-infrared region. Soft-mold reverse nanoimprint lithography with a subsequent lift-off process was employed to fabricate the multispectral filter array and its filter function was successfully extracted using a Fourier transform infrared microscope. With the measured filter function, we tested the feasibility of target spectrum reconstruction using a Tikhonov regularization method for an ill-posed linear problem and evaluated its applicability to the infrared spectroscopic sensor that monitors an oil condition. These results not only verify that the multispectral filter array composed of stopband filters based on the metal nanodiscs array when combined with the spectrum reconstruction technique, has great potential for use to a miniaturized mid-infrared on-chip spectrometer, but also provide effective guidance for the filter design.

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