Magnetorheological finishing of freeform optics using a spiral toolpath

2021 ◽  
Author(s):  
Christopher M. Supranowitz ◽  
Andrew Jones
Keyword(s):  
Magnetorheological Finishing ◽  
Freeform Optics

Magnetorheological Finishing of freeform optics

2007 ◽  
Author(s):  
Bill Messner ◽  
Andrew Jones ◽  
Bob Hallock ◽  
Christopher Hall
Keyword(s):  
Magnetorheological Finishing ◽  
Freeform Optics

scholarly journals Analysis on affecting factors of magnetorheological finishing

2021 ◽  
Vol 1750 ◽  
pp. 012067
Author(s):  
Lanfang Hao ◽  
Zhongling Liu ◽  
Shixu Li ◽  
Ruiyu Zhu ◽  
Xuli Zhu
Keyword(s):  
Affecting Factors ◽  
Magnetorheological Finishing

Experimental investigation into polishing of monocrystalline silicon wafer using double-disc chemical assisted magnetorheological finishing process

2021 ◽  
pp. 095440622098384
Author(s):  
Mayank Srivastava ◽  
Pulak M Pandey
Keyword(s):  
Surface Roughness ◽  
Silicon Wafer ◽  
Flow Rate ◽  
Silicon Wafers ◽  
Monocrystalline Silicon ◽  
Slurry Flow ◽  
Magnetorheological Finishing ◽  
Finishing Process ◽  
Process Factors ◽  
Slurry Flow Rate

In the present work, a novel hybrid finishing process that combines the two preferred methods in industries, namely, chemical-mechanical polishing (CMP) and magneto-rheological finishing (MRF), has been used to polish monocrystalline silicon wafers. The experiments were carried out on an indigenously developed double-disc chemical assisted magnetorheological finishing (DDCAMRF) experimental setup. The central composite design (CCD) was used to plan the experiments in order to estimate the effect of various process factors, namely polishing speed, slurry flow rate, percentage CIP concentration, and working gap on the surface roughness ([Formula: see text]) by DDCAMRF process. The analysis of variance was carried out to determine and analyze the contribution of significant factors affecting the surface roughness of polished silicon wafer. The statistical investigation revealed that percentage CIP concentration with a contribution of 30.6% has the maximum influence on the process performance followed by working gap (21.4%), slurry flow rate (14.4%), and polishing speed (1.65%). The surface roughness of polished silicon wafers was measured by the 3 D optical profilometer. Scanning electron microscopy (SEM) and atomic force microscopy (AFM) were carried out to understand the surface morphology of polished silicon wafer. It was found that the surface roughness of silicon wafer improved with the increase in polishing speed and slurry flow rate, whereas it was deteriorated with the increase in percentage CIP concentration and working gap.

A freeform optics design with limited data for extended LED light sources

2016 ◽  
Vol 63 (21) ◽  
pp. 2151-2158 ◽  
Author(s):  
Zhenfeng Zhuang ◽  
Phil Surman ◽  
Feihong Yu
Keyword(s):  
Light Sources ◽  
Limited Data ◽  
Led Light ◽  
Freeform Optics ◽  
Optics Design

scholarly journals Digitally switchable multi-focal lens using freeform optics

2018 ◽  
Vol 26 (8) ◽  
pp. 11007 ◽  
Author(s):  
Xuan Wang ◽  
Yi Qin ◽  
Hong Hua ◽  
Yun-Han Lee ◽  
Shin-Tson Wu
Keyword(s):  
Freeform Optics

A Mechanistic Model of Material Removal in Magnetorheological Finishing (MRF)

2007 ◽  
Vol 359-360 ◽  
pp. 384-388
Author(s):  
Feng Jun Chen ◽  
Shao Hui Yin ◽  
Jian Wu Yu ◽  
Hitoshi Ohmori ◽  
Wei Min Lin ◽  
...  
Keyword(s):  
Material Removal Rate ◽  
Material Removal ◽  
Reynolds Equation ◽  
Removal Rate ◽  
Mechanistic Model ◽  
Magnetorheological Fluid ◽  
Magnetorheological Finishing ◽  
Material Removal Model ◽  
Removal Model ◽  
The Magnetic Field

According to the sharp rheological characteristics of magnetorheological fluid in the magnetic field, the principle and mechanism of magnetorheological finishing is analyzed. Based on the Preston equation, the Reynolds equation and its boundary conditions, the two-dimensional material removal model is built and simulated. Furthermore, a series of MRF experiments are carried out, and the influence of the immersed depth and material kinds on material removal rate are clarified respectively. The experimental results are compared with the modeling results of material removal rate to confirm the mechanistic model validity.

Additive Manufacturing of Freeform Optics for Defense Applications

2021 ◽  
Author(s):  
George M. Williams ◽  
Hooman Akhavan ◽  
Charles Dupuy ◽  
Paul Harmon
Keyword(s):  
Additive Manufacturing ◽  
Freeform Optics
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