Stochastic side-lobe printing in EUV lithography: a simulation study

2020 ◽  
Author(s):  
Anatoly Burov ◽  
Alessandro Vaglio Pret ◽  
Stewart A. Robertson ◽  
Patrick B. Lee
Keyword(s):  
Simulation Study ◽  
Side Lobe ◽  
Euv Lithography

Stochastic side-lobe printing in EUV lithography: a simulation study

2021 ◽  
Vol 20 (03) ◽  
Author(s):  
Anatoly Burov ◽  
Alessandro Vaglio Pret ◽  
Stewart A. Robertson ◽  
Patrick Lee
Keyword(s):  
Simulation Study ◽  
Side Lobe ◽  
Euv Lithography

Simulation study of pattern printability for reflective mask in EUV lithography

2003 ◽  
Author(s):  
Minoru Sugawara ◽  
Akira Chiba ◽  
Iwao Nishiyama
Keyword(s):  
Simulation Study ◽  
Euv Lithography

Multifrequency and Nonuniformly-Spaced Arrays: Effects on Grating Lobe Amplitude

1982 ◽  
Vol 4 (4) ◽  
pp. 351-354
Author(s):  
B. G. Bardsley ◽  
D. A. Christensen ◽  
T. A. Pryor
Keyword(s):  
Computer Simulation ◽  
Simulation Study ◽  
Ultrasonic Transducer ◽  
Side Lobe ◽  
Beam Pattern ◽  
Periodic Array ◽  
Main Lobe ◽  
Computer Simulation Study ◽  
Grating Lobe ◽  
Transducer Arrays

A computer simulation study on the effects of multifrequency and aperiodic ultrasonic transducer arrays has shown that both methods improve grating lobe response when compared to a periodic array of the same aperture and element spacing. The multifrequency array produces a better beam pattern than either the aperiodic or combination aperiodic/multifrequency array. Both the aperiodic and multifrequency arrays have a narrower main lobe and higher side lobe response than a periodic array with reduced element spacing and an equal number of elements.

Simulation study of illumination effects in high-NA EUV lithography

2018 ◽  
Author(s):  
Mohamed Ismail ◽  
Peter Evanschitzky ◽  
Andreas Erdmann ◽  
Eelco van Setten ◽  
Gerardo Bottiglieri ◽  
...  
Keyword(s):  
Simulation Study ◽  
Euv Lithography
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