EUV resist chemical gradient enhancement by UV flood exposure for improvement in EUV resist resolution, process control, roughness, sensitivity and stochastic defectivity

Author(s):  
Seiji Nagahara ◽  
Cong Que Dinh ◽  
Keisuke Yoshida ◽  
Gosuke Shiraishi ◽  
Yoshihiro Kondo ◽  
...  
2009 ◽  
Vol 48 (12) ◽  
pp. 126004 ◽  
Author(s):  
Takahiro Kozawa ◽  
Hiroaki Oizumi ◽  
Toshiro Itani ◽  
Seiichi Tagawa

1956 ◽  
Vol 48 (2) ◽  
pp. 81-84
Author(s):  
William Priestley ◽  
B. Dudenbostel, Jr.

1999 ◽  
Vol 09 (PR8) ◽  
pp. Pr8-995-Pr8-1002 ◽  
Author(s):  
V. Hopfe ◽  
W. Grählert ◽  
O. Throl
Keyword(s):  

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