Divide-and-conquer laser beam deflection system: Fast, wide-ranging, and flexible

2020 ◽  
Author(s):  
Patrick Taschner ◽  
Jan F. Düsing ◽  
Jürgen Koch ◽  
Peter Jäschke ◽  
Stefan Kaierle ◽  
...  
Keyword(s):  
Laser Beam ◽  
Divide And Conquer ◽  
Beam Deflection ◽  
Deflection System

Scanning Capacitance Microscopy of Dopants in III-V Semiconductors

1998 ◽  
Vol 4 (S2) ◽  
pp. 640-641
Author(s):  
David V. Lang
Keyword(s):  
Quantum Well ◽  
Laser Beam ◽  
Surface Topography ◽  
Cross Sections ◽  
Beam Deflection ◽  
Doping Analysis ◽  
Scanning Capacitance Microscopy ◽  
Sample Spacing ◽  
Doping Profiles ◽  
Multi Quantum Well

Scanning Capacitance Microscopy (SCM) was first developed in 1985 as a method for sensing tip-to-sample spacing for surface topography profiling in connection with the RCA VideoDisc. Williams and coworkers were the first to use an SCM for obtaining dC/dV doping profiles in semiconductors, albeit with a rather modest resolution of 200 nm. More recently, it has been developed as a 50-nmresolution tool for microscopic doping analysis of semiconductors by measuring the tip-to-sample rf capacitance in an AFM controlled by other means, e.g. by laser beam deflection of a cantilever tip. In this paper we report on the application of SCM to study the 2D doping profiles of InP-based devices, such as multi-quantum well lasers.It is particularly convenient to prepare cross sections of III-V devices, since the material readily cleaves on [110] planes, as compared to silicon where cross sections must be obtained by painstaking polishing.

scholarly journals Modeling Rectangular Cantilevers during Torsion and Deflection for Application to Frictional Force Microscopy

2009 ◽  
Vol 15 (3) ◽  
pp. 259-264
Author(s):  
Victor C. Hayden ◽  
Luc Y. Beaulieu
Keyword(s):  
Frictional Force ◽  
Experimental Analysis ◽  
Optical Beam ◽  
Beam Deflection ◽  
Force Microscopy ◽  
Deflection System ◽  
First Case ◽  
Standard Orientation

AbstractA numerical and experimental analysis of the optical beam deflection system used to monitor microcantilevers subjected to simultaneous deflection and twisting such as in lateral or frictional force microscopy was performed. This study focused on two optical beam deflection orientations where in the first case the optical beam and the detector are at a right angle to the length of the cantilever and the second case, which is the more standard orientation, the optical beam is parallel to the length of the lever. This study finds that it is possible to model the twist and the deflection separately and treat each motion independently. Simulations have shown that the above-mentioned systems are equivalent in accuracy and sensitivity for monitoring the simultaneous twist and deflection of cantilevers.

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