scholarly journals High performance silver coating with PACA2M magnetron sputtering

2019 ◽  
Author(s):  
Catherine Grèzes-Besset ◽  
Nathalie Valette ◽  
Grégory Chauveau ◽  
Matthieu Castelnau ◽  
Karine Mathieu ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
High Performance ◽  
Silver Coating

AC Magnetron Sputtering: An Industrial Approach for High‐Voltage and High‐Performance Thin‐Film Cathodes for Li‐Ion Batteries

2021 ◽  
pp. 2002125
Author(s):  
Jokin Rikarte ◽  
Iñaki Madinabeitia ◽  
Giorgio Baraldi ◽  
Francisco José Fernández‐Carretero ◽  
Víctor Bellido‐González ◽  
...  
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
High Voltage ◽  
High Performance ◽  
Li Ion Batteries ◽  
Li Ion

High Performance Metal Surface Coating Using Ta2O5 Thin Film Prepared by D.C. Magnetron Sputtering

2014 ◽  
Vol 979 ◽  
pp. 240-243
Author(s):  
Narathon Khemasiri ◽  
Chanunthorn Chananonnawathorn ◽  
Mati Horprathum ◽  
Pitak Eiamchai ◽  
Pongpan Chindaudom ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Magnetron Sputtering ◽  
Film Thickness ◽  
Metal Surface ◽  
High Performance ◽  
Grazing Incidence ◽  
Surface Finishing ◽  
Afm Micrographs ◽  
Protective Performance

Tantalum oxide (Ta2O5) thin films were deposited as the protective layers for the metal surface finishing by the DC reactive magnetron sputtering system. The effect of the Ta2O5 film thickness, ranging from 25 nm to 200 nm, on the physical properties and the anti-corrosive performance were investigated. The grazing-incidence X-ray diffraction (GIXRD) and the atomic force microscopy (AFM) were used to examine the crystal structures and the surface topologies of the prepared films, respectively. The XRD results showed that the Ta2O5 thin films were all amorphous. The AFM micrographs demonstrated the film morphology with quite smooth surface features. The surface roughness tended to be rough when the film thickness was increased. To examine the protective performance of the films, the poteniostat and galvanometer was utilized to examine the electrochemical activities with the 1M NaCl as the corrosive electrolyte. The results from the I-V polarization curves (Tafel slope) indicated that, with the Ta2O5 thin film, the current density was significantly reduced by 3 orders of magnitude when compared with the blank sample. Such results were observed because of fully encapsulated surface of the samples were covered with the sputtered Ta2O5 thin films. The study also showed that the Ta2O5 thin film deposited at 50 nm yielded the most extreme protective performance. The Ta2O5 thin films therefore could be optimized for the smallest film thickness for highly potential role in the protective performance of the metal surface finishing products.

High performance thin film transistor with HfSiO x dielectric fabricated at room temperature RF-magnetron sputtering

2013 ◽  
Vol 9 (4) ◽  
pp. 381-384 ◽  
Author(s):  
Dongkyu Cho ◽  
Sanghyun Woo ◽  
Jungil Yang ◽  
Donghee Lee ◽  
Yoosung Lim ◽  
...  
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
High Performance ◽  
Room Temperature ◽  
Thin Film Transistor ◽  
Rf Magnetron Sputtering

Magnetron Sputtering Deposition Cu@Onion-like N–C as High-Performance Electrocatalysts for Oxygen Reduction Reaction

2017 ◽  
Vol 9 (48) ◽  
pp. 41945-41954 ◽  
Author(s):  
Hongyang Shao ◽  
Xiaoming Zhang ◽  
Hao Huang ◽  
Kan Zhang ◽  
Menglong Wang ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Oxygen Reduction Reaction ◽  
Oxygen Reduction ◽  
High Performance ◽  
Reduction Reaction ◽  
Sputtering Deposition

scholarly journals Correction: High-performance UV detectors based on room-temperature deposited amorphous Ga2O3 thin films by RF magnetron sputtering

2019 ◽  
Vol 7 (48) ◽  
pp. 15383-15383
Author(s):  
Shun Han ◽  
Xiaoling Huang ◽  
Mingzhi Fang ◽  
Weiguo Zhao ◽  
Shijie Xu ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
High Performance ◽  
Room Temperature ◽  
Rf Magnetron Sputtering ◽  
Uv Detectors

Correction for ‘High-performance UV detectors based on room-temperature deposited amorphous Ga2O3 thin films by RF magnetron sputtering’ by Shun Han et al., J. Mater. Chem. C, 2019, 7, 11834–11844.

Magnetron sputtering a high-performance catalyst for ultra-low-Pt loading PEMFCs

2020 ◽  
Vol 815 ◽  
pp. 152374 ◽  
Author(s):  
Kailin Fu ◽  
Liuli Zeng ◽  
Jiaming Liu ◽  
Min Liu ◽  
Shang Li ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
High Performance ◽  
Low Pt Loading
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