Status of the next generation CMOS-TDI detector for high-resolution imaging

2019 ◽  
Author(s):  
Andreas Eckardt ◽  
Stefan Gläsener ◽  
Ralf Reulke ◽  
Karsten Sengebusch ◽  
Bernd Zender
Keyword(s):  
High Resolution ◽  
High Resolution Imaging ◽  
Next Generation ◽  
Resolution Imaging

scholarly journals GO_3D_OBS – The Nankai Trough-inspired benchmark geomodel for seismic imaging methods assessment and next generation 3D surveys design (version 1.0)

2020 ◽  
Author(s):  
Andrzej Górszczyk ◽  
Stéphane Operto
Keyword(s):  
High Resolution ◽  
Large Scale ◽  
Nankai Trough ◽  
Regional Scale ◽  
Waveform Inversion ◽  
Leading Edge ◽  
High Resolution Imaging ◽  
Ocean Bottom ◽  
Next Generation ◽  
Resolution Imaging

Abstract. Detailed reconstruction of deep crustal targets by seismic methods remains a long-standing challenge. One key to address this challenge is the joint development of new seismic acquisition systems and leading-edge processing techniques. In marine environments, controlled-source seismic surveys at regional scale are typically carried out with sparse arrays of ocean bottom seismometers (OBSs), which provide incomplete and down-sampled subsurface illumination. To assess and minimize the acquisition footprint in high-resolution imaging process such as full waveform inversion, realistic crustal-scale benchmark models are clearly required.The deficiency of such models prompts us to build one and release it freely to the geophysical community. Here we introduce GO_3D_OBS – a 3D high-resolution geomodel representing a subduction zone, inspired by the geology of the Nankai Trough. The 175 km x 100 km x 30 km model integrates complex geological structures with a visco-elastic isotropic parametrization. It is defined in form of a uniform Cartesian grid containing 33.6e9 degrees of freedom for a grid interval of 25 m. The size of the model raises significant high-performance computing challenges to tackle large-scale forward propagation simulations and related inverse problems. We describe the workflow designed to implement all the model ingredients including 2D structural segments, their projection into the third dimension, stochastic components and physical parametrisation. Various wavefield simulations we present clearly reflect in the seismograms the structural complexity of the model and the footprint of different physical approximations. This benchmark model shall help to optimize the design of next generation 3D academic surveys – in particular but not only long-offset OBS experiments – to mitigate the acquisition footprint during high-resolution imaging of the deep crust.

scholarly journals GO_3D_OBS: the multi-parameter benchmark geomodel for seismic imaging method assessment and next-generation 3D survey design (version 1.0)

2021 ◽  
Vol 14 (3) ◽  
pp. 1773-1799
Author(s):  
Andrzej Górszczyk ◽  
Stéphane Operto
Keyword(s):  
High Resolution ◽  
Large Scale ◽  
Survey Design ◽  
Regional Scale ◽  
Leading Edge ◽  
Imaging Method ◽  
High Resolution Imaging ◽  
Ocean Bottom ◽  
Next Generation ◽  
Resolution Imaging

Abstract. Detailed reconstruction of deep crustal targets by seismic methods remains a long-standing challenge. One key to address this challenge is the joint development of new seismic acquisition systems and leading-edge processing techniques. In marine environments, controlled-source seismic surveys at a regional scale are typically carried out with sparse arrays of ocean bottom seismometers (OBSs), which provide incomplete and down-sampled subsurface illumination. To assess and minimize the acquisition footprint in high-resolution imaging process such as full waveform inversion, realistic crustal-scale benchmark models are clearly required. The deficiency of such models prompts us to build one and release it freely to the geophysical community. Here, we introduce GO_3D_OBS – a 3D high-resolution geomodel representing a subduction zone, inspired by the geology of the Nankai Trough. The 175km×100km×30km model integrates complex geological structures with a viscoelastic isotropic parameterization. It is defined in the form of a uniform Cartesian grid containing ∼33.6e9 degrees of freedom for a grid interval of 25 m. The size of the model raises significant high-performance computing challenges to tackle large-scale forward propagation simulations and related inverse problems. We describe the workflow designed to implement all the model ingredients including 2D structural segments, their projection into the third dimension, stochastic components, and physical parameterization. Various wavefield simulations that we present clearly reflect in the seismograms the structural complexity of the model and the footprint of different physical approximations. This benchmark model is intended to help to optimize the design of next-generation 3D academic surveys – in particular, but not only, long-offset OBS experiments – to mitigate the acquisition footprint during high-resolution imaging of the deep crust.

Alternative approaches to ultra-high resolution imaging

1991 ◽  
Vol 49 ◽  
pp. 650-651
Author(s):  
J.M. Cowley
Keyword(s):  
High Resolution ◽  
High Voltage ◽  
High Resolution Electron Microscopy ◽  
Crystal Defects ◽  
High Resolution Imaging ◽  
General Applicability ◽  
Resolution Electron ◽  
Radiation Resistant ◽  
Resolution Imaging ◽  
Alternative Approaches

By extrapolation of past experience, it would seem that the future of ultra-high resolution electron microscopy rests with the advances of electron optical engineering that are improving the instrumental stability of high voltage microscopes to achieve the theoretical resolutions of 1Å or better at 1MeV or higher energies. While these high voltage instruments will undoubtedly produce valuable results on chosen specimens, their general applicability has been questioned on the basis of the excessive radiation damage effects which may significantly modify the detailed structures of crystal defects within even the most radiation resistant materials in a period of a few seconds. Other considerations such as those of cost and convenience of use add to the inducement to consider seriously the possibilities for alternative approaches to the achievement of comparable resolutions.

Principle and practice of high-resolution imaging with a field-emission TEM

1992 ◽  
Vol 50 (1) ◽  
pp. 138-139
Author(s):  
Max T. Otten ◽  
Wim M.J. Coene
Keyword(s):  
High Resolution ◽  
Field Emission ◽  
Incidence Angle ◽  
Temporal Coherence ◽  
Energy Spread ◽  
High Resolution Imaging ◽  
Major Improvement ◽  
High Resolution Images ◽  
Resolution Imaging

High-resolution imaging with a LaB6 instrument is limited by the spatial and temporal coherence, with little contrast remaining beyond the point resolution. A Field Emission Gun (FEG) reduces the incidence angle by a factor 5 to 10 and the energy spread by 2 to 3. Since the incidence angle is the dominant limitation for LaB6 the FEG provides a major improvement in contrast transfer, reducing the information limit to roughly one half of the point resolution. The strong improvement, predicted from high-resolution theory, can be seen readily in diffractograms (Fig. 1) and high-resolution images (Fig. 2). Even if the information in the image is limited deliberately to the point resolution by using an objective aperture, the improved contrast transfer close to the point resolution (Fig. 1) is already worthwhile.

Imaging of ferroelectric domain walls by electron holography

1992 ◽  
Vol 50 (1) ◽  
pp. 246-247
Author(s):  
Xiao Zhang
Keyword(s):  
Magnetic Field ◽  
High Resolution ◽  
Domain Walls ◽  
Ferroelectric Domain ◽  
Object Wave ◽  
Electron Holography ◽  
High Resolution Imaging ◽  
Quantitative Measurements ◽  
Resolution Imaging ◽  
Electron Microscopes

Electron holography has recently been available to modern electron microscopy labs with the development of field emission electron microscopes. The unique advantage of recording both amplitude and phase of the object wave makes electron holography a effective tool to study electron optical phase objects. The visibility of the phase shifts of the object wave makes it possible to directly image the distributions of an electric or a magnetic field at high resolution. This work presents preliminary results of first high resolution imaging of ferroelectric domain walls by electron holography in BaTiO3 and quantitative measurements of electrostatic field distribution across domain walls.

The method of replication affects metal film granularity and resolution

1989 ◽  
Vol 47 ◽  
pp. 708-709
Author(s):  
George C. Ruben
Keyword(s):  
Electron Beam ◽  
High Resolution ◽  
Film Thickness ◽  
Single Molecule ◽  
Metal Film ◽  
Vertical Surface ◽  
High Resolution Imaging ◽  
Controllable Factors ◽  
Resolution Imaging

Single molecule resolution in electron beam sensitive, uncoated, noncrystalline materials has been impossible except in thin Pt-C replicas ≤ 150Å) which are resistant to the electron beam destruction. Previously the granularity of metal film replicas limited their resolution to ≥ 20Å. This paper demonstrates that Pt-C film granularity and resolution are a function of the method of replication and other controllable factors. Low angle 20° rotary , 45° unidirectional and vertical 9.7±1 Å Pt-C films deposited on mica under the same conditions were compared in Fig. 1. Vertical replication had a 5A granularity (Fig. 1c), the highest resolution (table), and coated the whole surface. 45° replication had a 9Å granulartiy (Fig. 1b), a slightly poorer resolution (table) and did not coat the whole surface. 20° rotary replication was unsuitable for high resolution imaging with 20-25Å granularity (Fig. 1a) and resolution 2-3 times poorer (table). Resolution is defined here as the greatest distance for which the metal coat on two opposing faces just grow together, that is, two times the apparent film thickness on a single vertical surface.

Performance Evaluation of a Novel Type of Low-Energy Electron Microscope

1990 ◽  
Vol 48 (1) ◽  
pp. 354-355
Author(s):  
Bertholdand Senftinger ◽  
Helmut Liebl
Keyword(s):  
Electron Microscope ◽  
High Resolution ◽  
Field Strength ◽  
Numerical Aperture ◽  
Low Energy ◽  
Energy Electron ◽  
High Resolution Imaging ◽  
Lens System ◽  
Resolution Imaging ◽  
Low Energy Electron

During the last few years the investigation of clean and adsorbate-covered solid surfaces as well as thin-film growth and molecular dynamics have given rise to a constant demand for high-resolution imaging microscopy with reflected and diffracted low energy electrons as well as photo-electrons. A recent successful implementation of a UHV low-energy electron microscope by Bauer and Telieps encouraged us to construct such a low energy electron microscope (LEEM) for high-resolution imaging incorporating several novel design features, which is described more detailed elsewhere.The constraint of high field strength at the surface required to keep the aberrations caused by the accelerating field small and high UV photon intensity to get an improved signal-to-noise ratio for photoemission led to the design of a tetrode emission lens system capable of also focusing the UV light at the surface through an integrated Schwarzschild-type objective. Fig. 1 shows an axial section of the emission lens in the LEEM with sample (28) and part of the sample holder (29). The integrated mirror objective (50a, 50b) is used for visual in situ microscopic observation of the sample as well as for UV illumination. The electron optical components and the sample with accelerating field followed by an einzel lens form a tetrode system. In order to keep the field strength high, the sample is separated from the first element of the einzel lens by only 1.6 mm. With a numerical aperture of 0.5 for the Schwarzschild objective the orifice in the first element of the einzel lens has to be about 3.0 mm in diameter. Considering the much smaller distance to the sample one can expect intense distortions of the accelerating field in front of the sample. Because the achievable lateral resolution depends mainly on the quality of the first imaging step, careful investigation of the aberrations caused by the emission lens system had to be done in order to avoid sacrificing high lateral resolution for larger numerical aperture.

High-resolution imaging of transition metal and sulfur-redox distribution in individual microfossils

2003 ◽  
Vol 104 ◽  
pp. 381-384 ◽  
Author(s):  
P. Philippot ◽  
J. Foriel ◽  
J. Susini ◽  
H. Khodja ◽  
N. Grassineau ◽  
...  
Keyword(s):  
High Resolution ◽  
Transition Metal ◽  
High Resolution Imaging ◽  
Resolution Imaging
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