Influence of power and pulsed regime of low frequency discharge on clusters incorporation in dielectric films for ReRAM application
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1973 ◽
Vol 31
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pp. 648-649
1976 ◽
Vol 34
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pp. 34-35
1968 ◽
Vol 26
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pp. 302-303
1986 ◽
Vol 44
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pp. 544-545
1996 ◽
Vol 54
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pp. 142-143