LIDE: high aspect ratio glass processing technology for the mass production of microfluidic devices for biomedical applications

Author(s):  
Robin Alexander Krüger ◽  
Malte Schulz-Ruhtenberg ◽  
Bernd Rösener ◽  
Oktavia Ostermann ◽  
Roman Ostholt ◽  
...  
Lab on a Chip ◽  
2009 ◽  
Vol 9 (13) ◽  
pp. 1951 ◽  
Author(s):  
Jason S. Kuo ◽  
Yongxi Zhao ◽  
Laiying Ng ◽  
Gloria S. Yen ◽  
Robert M. Lorenz ◽  
...  

Nanoscale ◽  
2015 ◽  
Vol 7 (18) ◽  
pp. 8233-8260 ◽  
Author(s):  
Raluca M. Fratila ◽  
Sara Rivera-Fernández ◽  
Jesús M. de la Fuente

2019 ◽  
Vol 21 (34) ◽  
pp. 18741-18752
Author(s):  
Matteo Avolio ◽  
Helena Gavilán ◽  
Eva Mazario ◽  
Francesca Brero ◽  
Paolo Arosio ◽  
...  

High aspect-ratio elongated nanoparticles with suitable porosity present partially controlled chemico-physical properties to obtain good heating/contrast efficiency for biomedical applications.


Carbon ◽  
2016 ◽  
Vol 102 ◽  
pp. 330-338 ◽  
Author(s):  
Yoshihiko Arao ◽  
Yoshinori Mizuno ◽  
Kunihiro Araki ◽  
Masatoshi Kubouchi

2019 ◽  
Vol 1 (9) ◽  
pp. 3392-3399 ◽  
Author(s):  
Dmitry N. Voylov ◽  
Vera Bocharova ◽  
Nickolay V. Lavrik ◽  
Ivan Vlassiouk ◽  
Georgios Polizos ◽  
...  

Demonstration of a proof of the concept and feasibility of a non-contact TERS approach promising for imaging of materials with high aspect ratio surface patterns and biomaterials.


2010 ◽  
Vol 1272 ◽  
Author(s):  
Saydulla Persheyev ◽  
Mervyn John Rose

AbstractSU8 Negative photoresist is finding high demand in applications such as MEMS sensors and waveguides. The possibility of photolithographic patterning and high physical and dielectric properties are attracting ever more users among workers in the electronics industry and increasingly in biomedical applications. In our work we employ an original method of exposing of SU8 and create high aspect ratio structures on glass and other substrates. Dry plasma etching results of negative epoxy-based photoresist by Inductively Coupled Plasma system using gases O2 and CF4 are presented.


Polymers ◽  
2021 ◽  
Vol 13 (21) ◽  
pp. 3750
Author(s):  
Pin-Chuan Chen ◽  
Po-Tsang Chen ◽  
Tuan Ngoc Anh Vo

Stereolithographic printing (SL) is widely used to create mini/microfluidic devices; however, the formation of microchannels smaller than 500 μm with good inner surface quality is still challenging due to the printing resolution of current commercial printers and the z-overcure error and scalloping phenomena. In the current study, we used SL printing to create microchannels with the aim of achieving a high degree of dimensional precision and a high-quality microchannel inner surface. Extensive experiments were performed and our results revealed the following: (1) the SL printing of microchannels can be implemented in three steps including channel layer printing, an oxygen inhibition process, and roof layer printing; (2) printing thickness should be reduced to minimize the scalloping phenomenon, which significantly improves dimensional accuracy and the quality of inner microchannel surfaces; (3) the inclusion of an oxygen inhibition step is a critical and efficient approach to suppressing the z-overcure error in order to eliminate the formation of in-channel obstructions; (4) microchannels with an extremely high aspect ratio of 40:1 (4000 μm in height and 100 μm in width) can be successfully manufactured within one hour by following the three-step printing process.


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