Novel main chain scission positive-tone photoresists for 248-nm lithography with wide post-exposure processing latitude as an alternative to chemically amplified systems
2002 ◽
Vol 15
(4)
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pp. 673-676
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2003 ◽
Vol 16
(1)
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pp. 13-18
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2008 ◽
Vol 90
(9)
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pp. 326-328
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1983 ◽
Vol 38
(1-2)
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pp. 100-106
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1978 ◽
Vol 14
(1)
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pp. 29-38
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