Characterization of glancing angle deposited (GLAD) optical coatings for UV applications

2018 ◽  
Author(s):  
Christopher J. Chinhong ◽  
James E. Platten ◽  
Michael J. D'Lallo ◽  
Thomas E. Gebo
Keyword(s):  
Optical Coatings ◽  
Glancing Angle

Structural characterization of TiO_2 optical coatings by Raman spectroscopy

1983 ◽  
Vol 22 (12) ◽  
pp. 1837 ◽  
Author(s):  
W. T. Pawlewicz ◽  
G. J. Exarhos ◽  
W. E. Conaway
Keyword(s):  
Raman Spectroscopy ◽  
Structural Characterization ◽  
Optical Coatings

scholarly journals Characterization of defect geometries in multilayer optical coatings

1994 ◽  
Vol 12 (5) ◽  
pp. 2808-2813 ◽  
Author(s):  
R. J. Tench ◽  
R. Chow ◽  
M. R. Kozlowski
Keyword(s):  
Optical Coatings

Characterization of diamond films for optical coatings

1993 ◽  
Vol 2 (5-7) ◽  
pp. 694-698 ◽  
Author(s):  
Hsien-Wen Ko ◽  
S.E. Hsu ◽  
S.J. Yang ◽  
M.S. Tsai ◽  
Y.H. Lee
Keyword(s):  
Diamond Films ◽  
Optical Coatings

X-ray Diffraction Studies of Polycrystalline Thin Films Using Glancing Angle Diffractometry

1988 ◽  
Vol 32 ◽  
pp. 311-321 ◽  
Author(s):  
R.A. Larsen ◽  
T.F. McNulty ◽  
R.P. Goehner ◽  
K.R. Crystal
Keyword(s):  
Thin Films ◽  
Deep Penetration ◽  
X Ray Diffraction ◽  
Parallel Beam ◽  
X Ray ◽  
Beam Geometry ◽  
Polycrystalline Thin Films ◽  
Glancing Angle ◽  
Parallel Beam Geometry

AbstractThe use of conventional θ/2θ diffraction methods for the characterization of polycrystalline thin films is not in general a satisfactory technique due to the relatively deep penetration of x-ray photons in most materials. Glancing incidence diffraction (GID) can compensate for the penetration problems inherent in the θ/2θ geometry. Parallel beam geometry has been developed in conjunction with GID to eliminate the focusing aberrations encountered when performing these types of measurements. During the past yearwe developed a parallel beam attachment which we have successfully configured to a number of systems.

Characterization of Optical Coatings with a CCD Angular and Spatial Resolved Scatterometer

2007 ◽  
Author(s):  
Myriam Zerrad ◽  
Michel Lequime ◽  
Carole Deumie ◽  
Claude Amra
Keyword(s):  
Optical Coatings

High Resolution X-ray Diffraction for the Characterization of Semiconducting Materials

1989 ◽  
Vol 33 ◽  
pp. 1-11 ◽  
Author(s):  
B. K. Tanner
Keyword(s):  
Bragg Peak ◽  
Thin Layers ◽  
X Ray Diffraction ◽  
Semiconducting Materials ◽  
Multiple Reflections ◽  
X Ray ◽  
Analyzer Crystal ◽  
Glancing Angle ◽  
Heteroepitaxial Layers

AbstractUse of a reference crystal to condition the beam in the double-axis diffractometer permits the Bragg peak width to be reduced to the correlation of the two crystal reflecting ranges. Some recent applications of double axis diffractometry to the study of heteroepitaxial layers are discussed. The advantages of multiple reflections for beam conditioning and the four reflection DuMond monochromator are examined. Glancing incidence and exit diffractometry permits the study of very thin layers, down to a few tens of nanometres in thickness and both synchrotron radiation and skew reflections can be used to tune the glancing angle close to the critical angle. Recent applications of triple-axis diffraction, where an analyzer crystal is used after the specimen, to the study of very thin single epitaxial layers and multiquantum well structures are reviewed.

Electrochemical Atomic Layer Deposition and Characterization of CdTe and PbTe Thin Films

2015 ◽  
Vol 31 ◽  
pp. 30-39 ◽  
Author(s):  
Amal Kabalan ◽  
Pritpal Singh
Keyword(s):  
Room Temperature ◽  
Atomic Layer ◽  
Flow Cell ◽  
X Ray ◽  
Optical Reflection ◽  
Reflection Data ◽  
Layer Deposition ◽  
Glancing Angle ◽  
Layer Flow

This study reports the cycle chemistries involved in depositing CdTe and PbTe nanofilms. An automated thin-layer flow cell electrodeposition system was used to deposit the films at room temperature. Cyclic voltammetry was used to study the Underpotential Deposition (UPD) of the compounds. The monolayer/cycle deposition rate was also monitored in order to insure that the film is depositing at a uniform rate. The chemical composition of the films was characterized using Energy-Dispersive X-ray Spectroscopy (EDS) on a Scanning Electron Microscope (SEM). The crystallinity of the films was studied using a glancing angle X-ray diffractometer. The bandgaps of the films were calculated using measured optical reflection data.

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