Sub-wavelength microscopy with surface plasmons

Author(s):  
Xiaodong Zeng ◽  
M Al-Amri ◽  
M. Suhail Zubairy
Optik ◽  
2014 ◽  
Vol 125 (10) ◽  
pp. 2339-2343 ◽  
Author(s):  
Stuti Joshi ◽  
Manish Verma ◽  
Mohd. Shahid Khan ◽  
H.C. Kandpal

Author(s):  
W. Srituravanich ◽  
N. Fang ◽  
C. Sun ◽  
S. Durant ◽  
M. Ambati ◽  
...  

As the next-generation technology moves below 100 nm mark, the need arises for a capability of manipulation and positioning of light on the scale of tens of nanometers. Plasmonic optics opens the door to operate beyond the diffraction limit by placing a sub-wavelength aperture in an opaque metal sheet. Recent experimental works [1] demonstrated that a giant transmission efficiency (>15%) can be achieved by exciting the surface plasmons with artificially displaced arrays of sub-wavelength holes. Moreover the effectively short modal wavelength of surface plasmons opens up the possibility to overcome the diffraction limit in the near-field lithography. This shows promise in a revolutionary high throughput and high density optical lithography. In this paper, we demonstrate the feasibility of near-field nanolithography by exciting surface plasmon on nanostructures perforated on metal film. Plasmonic masks of hole arrays and “bull’s eye” structures (single hole surrounded by concentric ring grating) [2] are fabricated using Focused Ion Beam (FIB). A special index matching spacer layer is then deposited onto the masks to ensure high transmissivity. Consequently, an I-line negative photoresist is spun on the top of spacer layer in order to obtain the exposure results. A FDTD simulation study has been conducted to predict the near field profile [3] of the designed plasmonic masks. Our preliminary exposure test using these hole-array masks demonstrated 170 nm period dot array patterns, well beyond the resolution limit of conventional lithography using near-UV wavelength. Furthermore, the exposure result obtained from the bull’s eye structures indicated the characteristics of periodicity and polarization dependence, which confirmed the contribution of surface plasmons.


Author(s):  
Adel Bousseksou ◽  
Jean-Philippe Tetienne ◽  
Raffaele Colombelli ◽  
Arthur Babuty ◽  
Ioana Moldovan-Doyen ◽  
...  

2019 ◽  
Vol 432 ◽  
pp. 112-115 ◽  
Author(s):  
Qiaofen Zhu ◽  
Sixing Xi ◽  
Xiaoxue Jiao ◽  
Huaying Wang ◽  
Liying Lang ◽  
...  

2019 ◽  
Vol 9 (5) ◽  
pp. 861 ◽  
Author(s):  
Litu Xu ◽  
Fang Li ◽  
Yahui Liu ◽  
Fuqiang Yao ◽  
Shuai Liu

Photonic devices are becoming more and more miniaturized and highly integrated with the advancement of micro-nano technology and the rapid development of integrated optics. Traditional semiconductor lasers have diffraction limit due to the feedback from the optical system, and their cavity length is more than half of the emission wavelength, so it is difficult to achieve miniaturization. Nanolasers based on surface plasmons can break through the diffraction limit and achieve deep sub-wavelength or even nano-scale laser emission. The improvement of modern nanomaterial preparation processes and the gradual maturity of micro-nano machining technology have also provided technical conditions for the development of sub-wavelength and nano-scale lasers. This paper describes the basic principles of surface plasmons and nano-resonators. The structure and characteristics of several kinds of plasmonic nanolasers are discussed. Finally, the paper looks forward to the application and development trend of nanolasers.


2012 ◽  
Vol 20 (13) ◽  
pp. 13738 ◽  
Author(s):  
A. Bousseksou ◽  
A. Babuty ◽  
J-P. Tetienne ◽  
I. Moldovan-Doyen ◽  
R. Braive ◽  
...  

2014 ◽  
Vol 22 (9) ◽  
pp. 10317 ◽  
Author(s):  
F. van Beijnum ◽  
A.S. Meeussen ◽  
C. Rétif ◽  
M.P. van Exter

2006 ◽  
Vol 267 (1) ◽  
pp. 253-259 ◽  
Author(s):  
T.J. Davis ◽  
S.C. Mayo ◽  
B.A. Sexton

1973 ◽  
Vol 34 (C6) ◽  
pp. C6-95-C6-95
Author(s):  
T. A. CALLCOTT ◽  
E. T. ARAKAWA
Keyword(s):  

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